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Title: Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing

Authors:
 [1] ;  [2] ;  [3] ;  [1] ;  [1]
  1. Physical Sciences Division, Pacific Northwest National Laboratory, P. O. Box 999, MSIN K8-88, Richland, Washington 99352, USA
  2. Michigan Technological University, 1400 Townsend Drive, Houghton, Michigan 49931, USA
  3. Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, P. O. Box 999, Richland, Washington 99352, USA
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Chemical Physics
Additional Journal Information:
Journal Name: Journal of Chemical Physics Journal Volume: 145 Journal Issue: 17; Journal ID: ISSN 0021-9606
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
English
OSTI Identifier:
1421077

Johnson, Grant E., Moser, Trevor, Engelhard, Mark, Browning, Nigel D., and Laskin, Julia. Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing. United States: N. p., Web. doi:10.1063/1.4966199.
Johnson, Grant E., Moser, Trevor, Engelhard, Mark, Browning, Nigel D., & Laskin, Julia. Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing. United States. doi:10.1063/1.4966199.
Johnson, Grant E., Moser, Trevor, Engelhard, Mark, Browning, Nigel D., and Laskin, Julia. 2016. "Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing". United States. doi:10.1063/1.4966199.
@article{osti_1421077,
title = {Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing},
author = {Johnson, Grant E. and Moser, Trevor and Engelhard, Mark and Browning, Nigel D. and Laskin, Julia},
abstractNote = {},
doi = {10.1063/1.4966199},
journal = {Journal of Chemical Physics},
number = 17,
volume = 145,
place = {United States},
year = {2016},
month = {11}
}

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