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Title: Insights to scaling remote plasma sources sustained in NF 3 mixtures

Authors:
 [1] ;  [2] ;  [3] ;  [2] ;  [2] ;  [2] ;  [3] ;  [1]
  1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122
  2. Samsung Electronics Co., Ltd., 129 Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-742, South Korea
  3. Department of Physics and Astronomy, University College London, London WC1E 6BT, United Kingdom
Publication Date:
Grant/Contract Number:
SC0001319; SC0014132
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 35; Journal Issue: 3; Related Information: CHORUS Timestamp: 2018-02-14 18:57:24; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1420694