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Title: Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods

Authors:
 [1] ;  [2] ;  [1] ;  [1] ;  [1] ;  [3] ;  [4] ;  [3] ;  [1]
  1. U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375
  2. American Society for Engineering Education, 1818 N Street NW, Washington, DC 20036
  3. Physics Department, Boston University, 590 Commonwealth Avenue, Boston, Massachusetts 02215
  4. Department of Physics, SUNY College at Brockport, 350 New Campus Dr, Brockport, New York 14420
Publication Date:
Grant/Contract Number:
AC02-98CH10886
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 35; Journal Issue: 3; Related Information: CHORUS Timestamp: 2018-02-14 18:57:46; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1420693