Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
- Authors:
-
- U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375
- American Society for Engineering Education, 1818 N Street NW, Washington, DC 20036
- Physics Department, Boston University, 590 Commonwealth Avenue, Boston, Massachusetts 02215
- Department of Physics, SUNY College at Brockport, 350 New Campus Dr, Brockport, New York 14420
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1420693
- Grant/Contract Number:
- AC02-98CH10886
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Vacuum Science and Technology A
- Additional Journal Information:
- Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 35 Journal Issue: 3; Journal ID: ISSN 0734-2101
- Publisher:
- American Vacuum Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Nepal, Neeraj, Anderson, Virginia R., Johnson, Scooter D., Downey, Brian P., Meyer, David J., DeMasi, Alexander, Robinson, Zachary R., Ludwig, Karl F., and Eddy, Jr., Charles R. Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods. United States: N. p., 2017.
Web. doi:10.1116/1.4978026.
Nepal, Neeraj, Anderson, Virginia R., Johnson, Scooter D., Downey, Brian P., Meyer, David J., DeMasi, Alexander, Robinson, Zachary R., Ludwig, Karl F., & Eddy, Jr., Charles R. Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods. United States. https://doi.org/10.1116/1.4978026
Nepal, Neeraj, Anderson, Virginia R., Johnson, Scooter D., Downey, Brian P., Meyer, David J., DeMasi, Alexander, Robinson, Zachary R., Ludwig, Karl F., and Eddy, Jr., Charles R. Mon .
"Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods". United States. https://doi.org/10.1116/1.4978026.
@article{osti_1420693,
title = {Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods},
author = {Nepal, Neeraj and Anderson, Virginia R. and Johnson, Scooter D. and Downey, Brian P. and Meyer, David J. and DeMasi, Alexander and Robinson, Zachary R. and Ludwig, Karl F. and Eddy, Jr., Charles R.},
abstractNote = {},
doi = {10.1116/1.4978026},
journal = {Journal of Vacuum Science and Technology A},
number = 3,
volume = 35,
place = {United States},
year = {Mon May 01 00:00:00 EDT 2017},
month = {Mon May 01 00:00:00 EDT 2017}
}
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https://doi.org/10.1116/1.4978026
https://doi.org/10.1116/1.4978026
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Cited by: 11 works
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