High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth
Abstract
Vertical GaN Schottky barrier diode (SBD) structures were grown by metal-organic chemical vapor deposition on free-standing GaN substrates. The carbon doping effect on SBD performance was studied by adjusting the growth conditions and spanning the carbon doping concentration between ≤3 × 1015 cm−3 and 3 × 1019 cm−3. Using the optimized growth conditions that resulted in the lowest carbon incorporation, a vertical GaN SBD with a 6-μm drift layer was fabricated. A low turn-on voltage of 0.77 V with a breakdown voltage over 800 V was obtained from the device.
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- OSTI Identifier:
- 1420572
- Grant/Contract Number:
- AR000450
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 108 Journal Issue: 6; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Cao, Y., Chu, R., Li, R., Chen, M., Chang, R., and Hughes, B. High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth. United States: N. p., 2016.
Web. doi:10.1063/1.4941814.
Cao, Y., Chu, R., Li, R., Chen, M., Chang, R., & Hughes, B. High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth. United States. https://doi.org/10.1063/1.4941814
Cao, Y., Chu, R., Li, R., Chen, M., Chang, R., and Hughes, B. Tue .
"High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth". United States. https://doi.org/10.1063/1.4941814.
@article{osti_1420572,
title = {High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth},
author = {Cao, Y. and Chu, R. and Li, R. and Chen, M. and Chang, R. and Hughes, B.},
abstractNote = {Vertical GaN Schottky barrier diode (SBD) structures were grown by metal-organic chemical vapor deposition on free-standing GaN substrates. The carbon doping effect on SBD performance was studied by adjusting the growth conditions and spanning the carbon doping concentration between ≤3 × 1015 cm−3 and 3 × 1019 cm−3. Using the optimized growth conditions that resulted in the lowest carbon incorporation, a vertical GaN SBD with a 6-μm drift layer was fabricated. A low turn-on voltage of 0.77 V with a breakdown voltage over 800 V was obtained from the device.},
doi = {10.1063/1.4941814},
journal = {Applied Physics Letters},
number = 6,
volume = 108,
place = {United States},
year = {Tue Feb 09 00:00:00 EST 2016},
month = {Tue Feb 09 00:00:00 EST 2016}
}
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https://doi.org/10.1063/1.4941814
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Cited by: 109 works
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Works referenced in this record:
Electrothermal Simulation and Thermal Performance Study of GaN Vertical and Lateral Power Transistors
journal, July 2013
- Zhang, Yuhao; Sun, Min; Liu, Zhihong
- IEEE Transactions on Electron Devices, Vol. 60, Issue 7
Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates
journal, July 2010
- Saitoh, Yu; Sumiyoshi, Kazuhide; Okada, Masaya
- Applied Physics Express, Vol. 3, Issue 8
1.5-kV and 2.2-m<inline-formula> <tex-math notation="TeX">\(\Omega \) </tex-math></inline-formula>-cm<inline-formula> <tex-math notation="TeX">\(^{2}\) </tex-math></inline-formula> Vertical GaN Transistors on Bulk-GaN Substrates
journal, September 2014
- Nie, Hui; Diduck, Quentin; Alvarez, Brian
- IEEE Electron Device Letters, Vol. 35, Issue 9
Buffer transport mechanisms in intentionally carbon doped GaN heterojunction field effect transistors
journal, June 2014
- Uren, Michael J.; Cäsar, Markus; Gajda, Mark A.
- Applied Physics Letters, Vol. 104, Issue 26
High Breakdown Voltage Undoped AlGaN–GaN Power HEMT on Sapphire Substrate and Its Demonstration for DC–DC Converter Application
journal, November 2004
- Saito, W.; Kuraguchi, M.; Takada, Y.
- IEEE Transactions on Electron Devices, Vol. 51, Issue 11
Effects of carbon on the electrical and optical properties of InN, GaN, and AlN
journal, January 2014
- Lyons, J. L.; Janotti, A.; Van de Walle, C. G.
- Physical Review B, Vol. 89, Issue 3
Design, fabrication, and performance analysis of GaN vertical electron transistors with a buried p/n junction
journal, May 2015
- Yeluri, Ramya; Lu, Jing; Hurni, Christophe A.
- Applied Physics Letters, Vol. 106, Issue 18
1200-V Normally Off GaN-on-Si Field-Effect Transistors With Low Dynamic on -Resistance
journal, May 2011
- Rongming Chu, ; Corrion, A.; Chen, M.
- IEEE Electron Device Letters, Vol. 32, Issue 5
7.5 kW/mm2 current switch using AlGaN/GaN metal-oxide-semiconductor heterostructure field effect transistors on SiC substrates
journal, January 2000
- Simin, G.; Hu, X.; Ilinskaya, N.
- Electronics Letters, Vol. 36, Issue 24
3.7 kV Vertical GaN PN Diodes
journal, February 2014
- Kizilyalli, Isik C.; Edwards, Andrew P.; Nie, Hui
- IEEE Electron Device Letters, Vol. 35, Issue 2
Near unity ideality factor and Shockley-Read-Hall lifetime in GaN-on-GaN p-n diodes with avalanche breakdown
journal, December 2015
- Hu, Zongyang; Nomoto, Kazuki; Song, Bo
- Applied Physics Letters, Vol. 107, Issue 24
Role of carbon in GaN
journal, December 2002
- Seager, C. H.; Wright, A. F.; Yu, J.
- Journal of Applied Physics, Vol. 92, Issue 11
Effect of threading dislocations on the Bragg peakwidths of GaN, AlGaN, and AlN heterolayers
journal, June 2005
- Lee, S. R.; West, A. M.; Allerman, A. A.
- Applied Physics Letters, Vol. 86, Issue 24
kV-Class GaN-on-Si HEMTs Enabling 99% Efficiency Converter at 800 V and 100 kHz
journal, June 2014
- Wu, Y. -F.; Gritters, J.; Shen, L.
- IEEE Transactions on Power Electronics, Vol. 29, Issue 6
Large area GaN and AlN template substrates fabricated by HVPE
journal, January 2009
- Soukhoveev, Vitali; Volkova, Anna; Ivantsov, Vladimir
- physica status solidi (c), Vol. 6, Issue S2
4-kV and 2.8-$\text{m}\Omega $ -cm 2 Vertical GaN p-n Diodes With Low Leakage Currents
journal, October 2015
- Kizilyalli, I. C.; Prunty, T.; Aktas, O.
- IEEE Electron Device Letters, Vol. 36, Issue 10
High voltage 4H-SiC Schottky barrier diodes
journal, June 1995
- Raghunathan, R.; Alok, D.; Baliga, B. J.
- IEEE Electron Device Letters, Vol. 16, Issue 6
Evolution of deep centers in GaN grown by hydride vapor phase epitaxy
journal, January 2001
- Fang, Z. -Q.; Look, D. C.; Jasinski, J.
- Applied Physics Letters, Vol. 78, Issue 3
Characterization of bulk GaN crystals grown from solution at near atmospheric pressure
journal, September 2010
- Garces, N. Y.; Feigelson, B. N.; Freitas, J. A.
- Journal of Crystal Growth, Vol. 312, Issue 18
Freestanding high quality GaN substrate by associated GaN nanorods self-separated hydride vapor-phase epitaxy
journal, August 2009
- Chao, C. L.; Chiu, C. H.; Lee, Y. J.
- Applied Physics Letters, Vol. 95, Issue 5
HVPE-GaN grown on MOCVD-GaN/sapphire template and ammonothermal GaN seeds: Comparison of structural, optical, and electrical properties
journal, May 2014
- Sochacki, Tomasz; Bryan, Zachary; Amilusik, Mikolaj
- Journal of Crystal Growth, Vol. 394