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Title: High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth

Abstract

Vertical GaN Schottky barrier diode (SBD) structures were grown by metal-organic chemical vapor deposition on free-standing GaN substrates. The carbon doping effect on SBD performance was studied by adjusting the growth conditions and spanning the carbon doping concentration between ≤3 × 1015 cm−3 and 3 × 1019 cm−3. Using the optimized growth conditions that resulted in the lowest carbon incorporation, a vertical GaN SBD with a 6-μm drift layer was fabricated. A low turn-on voltage of 0.77 V with a breakdown voltage over 800 V was obtained from the device.

Authors:
ORCiD logo; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
1420572
Grant/Contract Number:  
AR000450
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 108 Journal Issue: 6; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Cao, Y., Chu, R., Li, R., Chen, M., Chang, R., and Hughes, B. High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth. United States: N. p., 2016. Web. doi:10.1063/1.4941814.
Cao, Y., Chu, R., Li, R., Chen, M., Chang, R., & Hughes, B. High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth. United States. https://doi.org/10.1063/1.4941814
Cao, Y., Chu, R., Li, R., Chen, M., Chang, R., and Hughes, B. Tue . "High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth". United States. https://doi.org/10.1063/1.4941814.
@article{osti_1420572,
title = {High-voltage vertical GaN Schottky diode enabled by low-carbon metal-organic chemical vapor deposition growth},
author = {Cao, Y. and Chu, R. and Li, R. and Chen, M. and Chang, R. and Hughes, B.},
abstractNote = {Vertical GaN Schottky barrier diode (SBD) structures were grown by metal-organic chemical vapor deposition on free-standing GaN substrates. The carbon doping effect on SBD performance was studied by adjusting the growth conditions and spanning the carbon doping concentration between ≤3 × 1015 cm−3 and 3 × 1019 cm−3. Using the optimized growth conditions that resulted in the lowest carbon incorporation, a vertical GaN SBD with a 6-μm drift layer was fabricated. A low turn-on voltage of 0.77 V with a breakdown voltage over 800 V was obtained from the device.},
doi = {10.1063/1.4941814},
journal = {Applied Physics Letters},
number = 6,
volume = 108,
place = {United States},
year = {Tue Feb 09 00:00:00 EST 2016},
month = {Tue Feb 09 00:00:00 EST 2016}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1063/1.4941814

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Cited by: 109 works
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