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Title: Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9  μ m/h by plasma-assisted molecular beam epitaxy

Authors:
ORCiD logo [1] ;  [1] ;  [1] ;  [1] ;  [2]
  1. Georgia Institute of Technology, Atlanta, Georgia 30332, USA
  2. Veeco Instruments, St. Paul, Minnesota 55127, USA
Publication Date:
Grant/Contract Number:
AR0000470
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 118 Journal Issue: 15; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
Country of Publication:
United States
Language:
English
OSTI Identifier:
1420510

Gunning, Brendan P., Clinton, Evan A., Merola, Joseph J., Doolittle, W. Alan, and Bresnahan, Rich C.. Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9  μ m/h by plasma-assisted molecular beam epitaxy. United States: N. p., Web. doi:10.1063/1.4933278.
Gunning, Brendan P., Clinton, Evan A., Merola, Joseph J., Doolittle, W. Alan, & Bresnahan, Rich C.. Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9  μ m/h by plasma-assisted molecular beam epitaxy. United States. doi:10.1063/1.4933278.
Gunning, Brendan P., Clinton, Evan A., Merola, Joseph J., Doolittle, W. Alan, and Bresnahan, Rich C.. 2015. "Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9  μ m/h by plasma-assisted molecular beam epitaxy". United States. doi:10.1063/1.4933278.
@article{osti_1420510,
title = {Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9  μ m/h by plasma-assisted molecular beam epitaxy},
author = {Gunning, Brendan P. and Clinton, Evan A. and Merola, Joseph J. and Doolittle, W. Alan and Bresnahan, Rich C.},
abstractNote = {},
doi = {10.1063/1.4933278},
journal = {Journal of Applied Physics},
number = 15,
volume = 118,
place = {United States},
year = {2015},
month = {10}
}