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Title: Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing film

Authors:
 [1] ;  [2] ;  [1] ;  [1] ;  [3] ;  [1] ;  [1] ;  [4] ;  [4]
  1. Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden
  2. Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson AFB, Ohio 45433
  3. Frederick Seitz Materials Research Laboratory and Materials Science Department, University of Illinois, 104 South Goodwin, Urbana, Illinois 61801
  4. Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden and Frederick Seitz Materials Research Laboratory and Materials Science Department, University of Illinois, 104 South Goodwin, Urbana, Illinois 61801
Publication Date:
Grant/Contract Number:
FG02-07ER46453; FG02-07ER46471
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Additional Journal Information:
Journal Name: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Journal Volume: 33 Journal Issue: 5; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1420506

Fager, Hanna, Howe, Brandon M., Greczynski, Grzegorz, Jensen, Jens, Mei, A. B., Lu, Jun, Hultman, Lars, Greene, J. E., and Petrov, Ivan. Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing film. United States: N. p., Web. doi:10.1116/1.4920980.
Fager, Hanna, Howe, Brandon M., Greczynski, Grzegorz, Jensen, Jens, Mei, A. B., Lu, Jun, Hultman, Lars, Greene, J. E., & Petrov, Ivan. Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing film. United States. doi:10.1116/1.4920980.
Fager, Hanna, Howe, Brandon M., Greczynski, Grzegorz, Jensen, Jens, Mei, A. B., Lu, Jun, Hultman, Lars, Greene, J. E., and Petrov, Ivan. 2015. "Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing film". United States. doi:10.1116/1.4920980.
@article{osti_1420506,
title = {Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing film},
author = {Fager, Hanna and Howe, Brandon M. and Greczynski, Grzegorz and Jensen, Jens and Mei, A. B. and Lu, Jun and Hultman, Lars and Greene, J. E. and Petrov, Ivan},
abstractNote = {},
doi = {10.1116/1.4920980},
journal = {Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films},
number = 5,
volume = 33,
place = {United States},
year = {2015},
month = {5}
}