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Title: Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis

Authors:
 [1] ;  [1] ;  [1] ;  [1] ;  [1]
  1. School of Chemical and Biomolecular Engineering Cornell University, Ithaca, New York 14853
Publication Date:
Grant/Contract Number:
DESC0006647
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Volume: 35 Journal Issue: 6; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1420472

Chen, Jiun-Ruey, Zhang, Wenyu, Nahm, Rambert K., DiFeo, Michael A., and Engstrom, James R.. Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis. United States: N. p., Web. doi:10.1116/1.4996553.
Chen, Jiun-Ruey, Zhang, Wenyu, Nahm, Rambert K., DiFeo, Michael A., & Engstrom, James R.. Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis. United States. doi:10.1116/1.4996553.
Chen, Jiun-Ruey, Zhang, Wenyu, Nahm, Rambert K., DiFeo, Michael A., and Engstrom, James R.. 2017. "Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis". United States. doi:10.1116/1.4996553.
@article{osti_1420472,
title = {Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis},
author = {Chen, Jiun-Ruey and Zhang, Wenyu and Nahm, Rambert K. and DiFeo, Michael A. and Engstrom, James R.},
abstractNote = {},
doi = {10.1116/1.4996553},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 6,
volume = 35,
place = {United States},
year = {2017},
month = {11}
}