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This content will become publicly available on November 16, 2018

Title: Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films

Authors:
 [1] ;  [1]
  1. Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027
Publication Date:
Grant/Contract Number:
SC0012704
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 35; Journal Issue: 6; Related Information: CHORUS Timestamp: 2018-02-14 09:41:44; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1420471