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Title: Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films

Authors:
 [1];  [1]
  1. Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1420471
Grant/Contract Number:  
[SC0012704]
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology A
Additional Journal Information:
[Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 35 Journal Issue: 6]; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Barmak, Katayun, and Liu, Jiaxing. Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films. United States: N. p., 2017. Web. doi:10.1116/1.5003628.
Barmak, Katayun, & Liu, Jiaxing. Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films. United States. doi:10.1116/1.5003628.
Barmak, Katayun, and Liu, Jiaxing. Wed . "Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films". United States. doi:10.1116/1.5003628.
@article{osti_1420471,
title = {Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films},
author = {Barmak, Katayun and Liu, Jiaxing},
abstractNote = {},
doi = {10.1116/1.5003628},
journal = {Journal of Vacuum Science and Technology A},
number = [6],
volume = [35],
place = {United States},
year = {2017},
month = {11}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1116/1.5003628

Citation Metrics:
Cited by: 1 work
Citation information provided by
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