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This content will become publicly available on January 22, 2019

Title: High growth rate hydride vapor phase epitaxy at low temperature through use of uncracked hydrides

Authors:
 [1] ; ORCiD logo [2] ;  [1] ;  [1]
  1. National Renewable Energy Laboratory, Golden, Colorado 80401, USA
  2. Rose-Hulman Institute of Technology, Terre Haute, Indiana 47803, USA
Publication Date:
Grant/Contract Number:
AC36-08GO28308
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 112; Journal Issue: 4; Related Information: CHORUS Timestamp: 2018-01-22 11:03:29; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1417702