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This content will become publicly available on December 29, 2018

Title: Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S

Authors:
 [1] ;  [2] ;  [1] ;  [3] ;  [1] ;  [1] ;  [1] ;  [4] ;  [5]
  1. Energy Systems Division, Argonne National Laboratory, 9700 S. Cass Ave., Argonne, Illinois 60439
  2. Micron School of Materials Science and Engineering, Boise State University, 1910 University Dr., Boise, Idaho 83725
  3. Department of Chemistry, Northwestern University, 2145 Sheridan Rd., Evanston, Illinois 60208
  4. Micron School of Materials Science and Engineering, Boise State University, 1910 University Dr., Boise Idaho 83725
  5. Energy Systems Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, Illinois 60439
Publication Date:
Grant/Contract Number:
AC02-06CH11357; SC0014664
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Volume: 36 Journal Issue: 1; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1415157

Mane, Anil U., Letourneau, Steven, Mandia, David J., Liu, Jian, Libera, Joseph A., Lei, Yu, Peng, Qing, Graugnard, Elton, and Elam, Jeffrey W.. Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S. United States: N. p., Web. doi:10.1116/1.5003423.
Mane, Anil U., Letourneau, Steven, Mandia, David J., Liu, Jian, Libera, Joseph A., Lei, Yu, Peng, Qing, Graugnard, Elton, & Elam, Jeffrey W.. Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S. United States. doi:10.1116/1.5003423.
Mane, Anil U., Letourneau, Steven, Mandia, David J., Liu, Jian, Libera, Joseph A., Lei, Yu, Peng, Qing, Graugnard, Elton, and Elam, Jeffrey W.. 2018. "Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S". United States. doi:10.1116/1.5003423.
@article{osti_1415157,
title = {Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S},
author = {Mane, Anil U. and Letourneau, Steven and Mandia, David J. and Liu, Jian and Libera, Joseph A. and Lei, Yu and Peng, Qing and Graugnard, Elton and Elam, Jeffrey W.},
abstractNote = {},
doi = {10.1116/1.5003423},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 1,
volume = 36,
place = {United States},
year = {2018},
month = {1}
}