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This content will become publicly available on December 19, 2018

Title: Role of the dense amorphous carbon layer in photoresist etching

Authors:
 [1] ;  [2] ;  [2] ;  [3] ;  [1]
  1. Department of Materials Science and Engineering, Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742
  2. Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742
  3. Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, Institute for Physical Science and Technology, University of Maryland, College Park, Maryland 20742, and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, Maryland 20742
Publication Date:
Grant/Contract Number:
SC0001939
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Related Information: CHORUS Timestamp: 2018-02-14 20:19:05; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1414017