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This content will become publicly available on December 1, 2018

Title: Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition

Authors:
 [1] ;  [2] ; ORCiD logo [3] ;  [3] ;  [4] ;  [3] ; ORCiD logo [1]
  1. Peter A. Rock Thermochemistry Laboratory and NEAT ORU, University of California Davis, Davis California
  2. Peter A. Rock Thermochemistry Laboratory and NEAT ORU, University of California Davis, Davis California, State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an China
  3. Department of Chemistry and Biochemistry, Brigham Young University, Provo Utah
  4. Logic Technology Development, Intel Corporation, Hillsboro Oregon
Publication Date:
Grant/Contract Number:
SC0016446
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of the American Ceramic Society
Additional Journal Information:
Related Information: CHORUS Timestamp: 2017-12-01 23:13:19; Journal ID: ISSN 0002-7820
Publisher:
Wiley-Blackwell
Sponsoring Org:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
Country of Publication:
United States
Language:
English
OSTI Identifier:
1411087