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Title: Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma‐enhanced chemical vapor deposition

Authors:
 [1] ;  [2] ; ORCiD logo [3] ;  [3] ;  [4] ;  [3] ; ORCiD logo [1]
  1. Peter A. Rock Thermochemistry Laboratory and NEAT ORU University of California Davis Davis California
  2. Peter A. Rock Thermochemistry Laboratory and NEAT ORU University of California Davis Davis California, State Key Laboratory for Mechanical Behavior of Materials Xi'an Jiaotong University Xi'an China
  3. Department of Chemistry and Biochemistry Brigham Young University Provo Utah
  4. Logic Technology Development Intel Corporation Hillsboro Oregon
Publication Date:
Grant/Contract Number:
DE‐SC0016446
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of the American Ceramic Society
Additional Journal Information:
Journal Name: Journal of the American Ceramic Society Journal Volume: 101 Journal Issue: 5; Journal ID: ISSN 0002-7820
Publisher:
Wiley-Blackwell
Sponsoring Org:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
Country of Publication:
United States
Language:
English
OSTI Identifier:
1411087

Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., and Navrotsky, Alexandra. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma‐enhanced chemical vapor deposition. United States: N. p., Web. doi:10.1111/jace.15350.
Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., & Navrotsky, Alexandra. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma‐enhanced chemical vapor deposition. United States. doi:10.1111/jace.15350.
Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., and Navrotsky, Alexandra. 2017. "Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma‐enhanced chemical vapor deposition". United States. doi:10.1111/jace.15350.
@article{osti_1411087,
title = {Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma‐enhanced chemical vapor deposition},
author = {Chen, Jiewei and Niu, Min and Calvin, Jason and Asplund, Megan and King, Sean W. and Woodfield, Brian F. and Navrotsky, Alexandra},
abstractNote = {},
doi = {10.1111/jace.15350},
journal = {Journal of the American Ceramic Society},
number = 5,
volume = 101,
place = {United States},
year = {2017},
month = {12}
}