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This content will become publicly available on November 14, 2018

Title: Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors

Authors:
 [1] ;  [1] ;  [2] ;  [3] ;  [4] ;  [4] ;  [2] ;  [5] ; ORCiD logo [6]
  1. NanoScience Technology Center, University of Central Florida, Orlando FL 32826 USA
  2. Physical and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland WA 99352 USA
  3. Department of Materials Science and Engineering, University of Central Florida, Orlando FL 32826 USA
  4. Department of Mechanical and Aerospace Engineering, University of Central Florida, Orlando FL 32816 USA
  5. Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland WA 99352 USA
  6. NanoScience Technology Center, University of Central Florida, Orlando FL 32826 USA, Department of Materials Science and Engineering, University of Central Florida, Orlando FL 32826 USA
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Small
Additional Journal Information:
Journal Volume: 14; Journal Issue: 3; Related Information: CHORUS Timestamp: 2018-01-18 09:28:20; Journal ID: ISSN 1613-6810
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1408786