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Title: Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications

Authors:
 [1];  [2]
  1. University of Kentucky, Center for Applied Energy Research, 40511 Lexington, KY USA
  2. Stevens Institute of Technology, Department of Chemical Engineering and Materials Science, Castle Point on Hudson 07030 Hoboken, NJ USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1404753
Grant/Contract Number:  
SC0012704
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Fuel Cells
Additional Journal Information:
Journal Name: Fuel Cells Journal Volume: 17 Journal Issue: 6; Journal ID: ISSN 1615-6846
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Omosebi, A., and Besser, R. S. Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications. Germany: N. p., 2017. Web. doi:10.1002/fuce.201600183.
Omosebi, A., & Besser, R. S. Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications. Germany. doi:10.1002/fuce.201600183.
Omosebi, A., and Besser, R. S. Wed . "Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications". Germany. doi:10.1002/fuce.201600183.
@article{osti_1404753,
title = {Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications},
author = {Omosebi, A. and Besser, R. S.},
abstractNote = {},
doi = {10.1002/fuce.201600183},
journal = {Fuel Cells},
number = 6,
volume = 17,
place = {Germany},
year = {2017},
month = {10}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1002/fuce.201600183

Citation Metrics:
Cited by: 2 works
Citation information provided by
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