DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ab initio modeling of transport and thermodynamic stability for hafnia memristive devices

Abstract

HfO2-based memristive switching devices are currently under intensive investigation due to their high performance and mature fabrication techniques. However, several critical issues have to be addressed to bring them from lab to market. We have recently looked into two important issues with the use of density functional theory methods. One is the wide distribution of device resistance in off-states. We have modeled the switching process of a Pt-HfO2-Pt structure for which quantized conductance was observed. Oxygen atoms moving inside a conductive oxygen vacancy filament divide the filament into several quantum wells. Device conductance changes exponentially when one oxygen atom moves away from interface into filament. We propose that the high sensitivity of device conductance to the position of oxygen atoms results in the large variation of device off-state resistance. Another issue that we have recently addressed is the poor switching performance of devices based on a TiN-HfO2-TiN structure. While recent experiments have shown that by inserting an "oxygen scavenger" metal between positive electrode and oxide significantly improves device performance, the fundamental understanding of the improvement is lacking.We provide detailed understanding how scavenger layers improve device performance. First, we show that Ta insertion facilitates formation of on-states by reducing the formationmore » energy. Second, the inserted Ta layer reduces the Schottky barrier height in the off-states by changing interface electric dipole at the oxide electrode interface. Nevertheless, the device maintains a high on/off resistance ratio. Finally, with Ta insertion the on-state conductance becomes much less sensitive to the specific location from which the oxygen was removed from the oxide. In conclusion, our studies provide fundamental understanding needed for enabling realization of a non-volatile memory technology with reduced energy consumption.« less

Authors:
 [1];  [2];  [1]; ORCiD logo [1]
  1. Argonne National Lab. (ANL), Lemont, IL (United States)
  2. National Physical Lab., Teddington (United Kingdom)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1402425
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Computational Electronics
Additional Journal Information:
Journal Volume: 2017; Journal ID: ISSN 1569-8025
Publisher:
Springer
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; Density functional theory; Electron transmission; Electronic structure; Hafnium oxide; Memristive switching devices; Oxygen scavenger; Oxygen vacancy; Quantum well; Resonant tunneling; Schottky barrier height; quantum transport

Citation Formats

Zhong, Xiaoliang, Rungger, Ivan, Zapol, Peter, and Heinonen, Olle. Ab initio modeling of transport and thermodynamic stability for hafnia memristive devices. United States: N. p., 2017. Web. doi:10.1007/s10825-017-1043-2.
Zhong, Xiaoliang, Rungger, Ivan, Zapol, Peter, & Heinonen, Olle. Ab initio modeling of transport and thermodynamic stability for hafnia memristive devices. United States. https://doi.org/10.1007/s10825-017-1043-2
Zhong, Xiaoliang, Rungger, Ivan, Zapol, Peter, and Heinonen, Olle. Tue . "Ab initio modeling of transport and thermodynamic stability for hafnia memristive devices". United States. https://doi.org/10.1007/s10825-017-1043-2. https://www.osti.gov/servlets/purl/1402425.
@article{osti_1402425,
title = {Ab initio modeling of transport and thermodynamic stability for hafnia memristive devices},
author = {Zhong, Xiaoliang and Rungger, Ivan and Zapol, Peter and Heinonen, Olle},
abstractNote = {HfO2-based memristive switching devices are currently under intensive investigation due to their high performance and mature fabrication techniques. However, several critical issues have to be addressed to bring them from lab to market. We have recently looked into two important issues with the use of density functional theory methods. One is the wide distribution of device resistance in off-states. We have modeled the switching process of a Pt-HfO2-Pt structure for which quantized conductance was observed. Oxygen atoms moving inside a conductive oxygen vacancy filament divide the filament into several quantum wells. Device conductance changes exponentially when one oxygen atom moves away from interface into filament. We propose that the high sensitivity of device conductance to the position of oxygen atoms results in the large variation of device off-state resistance. Another issue that we have recently addressed is the poor switching performance of devices based on a TiN-HfO2-TiN structure. While recent experiments have shown that by inserting an "oxygen scavenger" metal between positive electrode and oxide significantly improves device performance, the fundamental understanding of the improvement is lacking.We provide detailed understanding how scavenger layers improve device performance. First, we show that Ta insertion facilitates formation of on-states by reducing the formation energy. Second, the inserted Ta layer reduces the Schottky barrier height in the off-states by changing interface electric dipole at the oxide electrode interface. Nevertheless, the device maintains a high on/off resistance ratio. Finally, with Ta insertion the on-state conductance becomes much less sensitive to the specific location from which the oxygen was removed from the oxide. In conclusion, our studies provide fundamental understanding needed for enabling realization of a non-volatile memory technology with reduced energy consumption.},
doi = {10.1007/s10825-017-1043-2},
journal = {Journal of Computational Electronics},
number = ,
volume = 2017,
place = {United States},
year = {2017},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record

Citation Metrics:
Cited by: 1 work
Citation information provided by
Web of Science

Save / Share:

Works referenced in this record:

The missing memristor found
journal, May 2008

  • Strukov, Dmitri B.; Snider, Gregory S.; Stewart, Duncan R.
  • Nature, Vol. 453, Issue 7191
  • DOI: 10.1038/nature06932

Oxygen-modulated quantum conductance for ultrathin HfO 2 -based memristive switching devices
journal, October 2016


Control of Switching Modes and Conductance Quantization in Oxygen Engineered HfO x based Memristive Devices
journal, July 2017

  • Sharath, Sankaramangalam Ulhas; Vogel, Stefan; Molina-Luna, Leopoldo
  • Advanced Functional Materials, Vol. 27, Issue 32
  • DOI: 10.1002/adfm.201700432

Variation of switching mechanism in TiO2 thin film resistive random access memory with Ag and graphene electrodes
journal, April 2013


Room temperature conductance quantization in V‖amorphous‐V 2 O 5 ‖V thin film structures
journal, November 1993

  • Yun, Eui‐Jung; Becker, M. F.; Walser, R. M.
  • Applied Physics Letters, Vol. 63, Issue 18
  • DOI: 10.1063/1.110459

Generalized gradient approximation for the exchange-correlation hole of a many-electron system
journal, December 1996


Metal oxide resistive memory switching mechanism based on conductive filament properties
journal, December 2011

  • Bersuker, G.; Gilmer, D. C.; Veksler, D.
  • Journal of Applied Physics, Vol. 110, Issue 12
  • DOI: 10.1063/1.3671565

Atomic View of Filament Growth in Electrochemical Memristive Elements
journal, August 2015

  • Lv, Hangbing; Xu, Xiaoxin; Sun, Pengxiao
  • Scientific Reports, Vol. 5, Issue 1
  • DOI: 10.1038/srep13311

Effect of the electrode materials on the resistive switching of Ti 4 O 7
journal, July 2012

  • Ko, Dong-Su; Kim, Seong-Il; Ahn, Tae-Young
  • Applied Physics Letters, Vol. 101, Issue 5
  • DOI: 10.1063/1.4739949

Spin and molecular electronics in atomically generated orbital landscapes
journal, February 2006


Effects of electrode material and configuration on the characteristics of planar resistive switching devices
journal, November 2013

  • Peng, H. Y.; Pu, L.; Wu, J. C.
  • APL Materials, Vol. 1, Issue 5
  • DOI: 10.1063/1.4827597

Dielectric properties of TiC x , TiN x , VC x , and VN x from 1.5 to 40 eV determined by electron-energy-loss spectroscopy
journal, August 1984


Imaging the Three-Dimensional Conductive Channel in Filamentary-Based Oxide Resistive Switching Memory
journal, November 2015


The SIESTA method for ab initio order- N materials simulation
journal, March 2002

  • Soler, José M.; Artacho, Emilio; Gale, Julian D.
  • Journal of Physics: Condensed Matter, Vol. 14, Issue 11
  • DOI: 10.1088/0953-8984/14/11/302

Metal/TiO2 interfaces for memristive switches
journal, January 2011


TiNx/HfO2 interface dipole induced by oxygen scavenging
journal, March 2011

  • Afanas’ev, V. V.; Stesmans, A.; Pantisano, L.
  • Applied Physics Letters, Vol. 98, Issue 13
  • DOI: 10.1063/1.3570647

Conductance quantization in oxygen-anion-migration-based resistive switching memory devices
journal, July 2013

  • Chen, C.; Gao, S.; Zeng, F.
  • Applied Physics Letters, Vol. 103, Issue 4
  • DOI: 10.1063/1.4816747

Conduction Channel Formation and Dissolution Due to Oxygen Thermophoresis/Diffusion in Hafnium Oxide Memristors
journal, November 2016


Inhomogeneous Electron Gas
journal, November 1964


A study of the leakage current in TiN/HfO2/TiN capacitors
journal, July 2012


Thickness independent reduced forming voltage in oxygen engineered HfO 2 based resistive switching memories
journal, August 2014

  • Sharath, S. U.; Kurian, J.; Komissinskiy, P.
  • Applied Physics Letters, Vol. 105, Issue 7
  • DOI: 10.1063/1.4893605

High ON/OFF Ratio and Quantized Conductance in Resistive Switching of ${\rm TiO}_{2}$ on Silicon
journal, November 2013

  • Hu, Chengqing; McDaniel, Martin D.; Ekerdt, John G.
  • IEEE Electron Device Letters, Vol. 34, Issue 11
  • DOI: 10.1109/LED.2013.2282154

The effect of a Ta oxygen scavenger layer on HfO 2 -based resistive switching behavior: thermodynamic stability, electronic structure, and low-bias transport
journal, January 2016

  • Zhong, Xiaoliang; Rungger, Ivan; Zapol, Peter
  • Physical Chemistry Chemical Physics, Vol. 18, Issue 10
  • DOI: 10.1039/C6CP00450D

Semiconducting-like filament formation in TiN/HfO 2 /TiN resistive switching random access memories
journal, April 2012

  • De Stefano, F.; Houssa, M.; Kittl, J. A.
  • Applied Physics Letters, Vol. 100, Issue 14
  • DOI: 10.1063/1.3696672

Towards molecular spintronics
journal, March 2005

  • Rocha, Alexandre R.; García-suárez, Víctor M.; Bailey, Steve W.
  • Nature Materials, Vol. 4, Issue 4
  • DOI: 10.1038/nmat1349

Observation of Conductance Quantization in Oxide-Based Resistive Switching Memory
journal, June 2012


First-principles calculation of the TiN effective work function on Si O 2 and on Hf O 2
journal, November 2006


Nanoscale cation motion in TaOx, HfOx and TiOx memristive systems
journal, September 2015

  • Wedig, Anja; Luebben, Michael; Cho, Deok-Yong
  • Nature Nanotechnology, Vol. 11, Issue 1
  • DOI: 10.1038/nnano.2015.221

Negative oxygen vacancies in HfO2 as charge traps in high-k stacks
journal, August 2006

  • Gavartin, J. L.; Muñoz Ramo, D.; Shluger, A. L.
  • Applied Physics Letters, Vol. 89, Issue 8
  • DOI: 10.1063/1.2236466

Quantum-size effects in hafnium-oxide resistive switching
journal, May 2013

  • Long, Shibing; Lian, Xiaojuan; Cagli, Carlo
  • Applied Physics Letters, Vol. 102, Issue 18
  • DOI: 10.1063/1.4802265

High Temperature Structure and Thermal Expansion of Some Metals as Determined by X‐Ray Diffraction Data. I. Platinum, Tantalum, Niobium, and Molybdenum
journal, April 1951

  • Edwards, James W.; Speiser, Rudolph; Johnston, Herrick L.
  • Journal of Applied Physics, Vol. 22, Issue 4
  • DOI: 10.1063/1.1699977

Filament observation in metal-oxide resistive switching devices
journal, March 2013

  • Celano, Umberto; Yin Chen, Yang; Wouters, Dirk J.
  • Applied Physics Letters, Vol. 102, Issue 12
  • DOI: 10.1063/1.4798525

Electronic band structure of zirconia and hafnia polymorphs from the G W perspective
journal, February 2010


Transport properties of oxygen vacancy filaments in metal/crystalline or amorphous HfO 2 /metal structures
journal, October 2012


Memristive devices for computing
journal, January 2013

  • Yang, J. Joshua; Strukov, Dmitri B.; Stewart, Duncan R.
  • Nature Nanotechnology, Vol. 8, Issue 1, p. 13-24
  • DOI: 10.1038/nnano.2012.240

First-principles generalized gradient approximation (GGA)+Ud+Up studies of electronic structures and optical properties in cubic HfO2
journal, January 2014


Self-Consistent Equations Including Exchange and Correlation Effects
journal, November 1965


Efficient pseudopotentials for plane-wave calculations
journal, January 1991