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Title: Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process

Authors:
; ; ; ; ;
Publication Date:
Grant/Contract Number:
DE AC36-08G028308; IUSSTF/JCERDC-SERIIUS/2012
Type:
Publisher's Accepted Manuscript
Journal Name:
Chemical Engineering Journal
Additional Journal Information:
Journal Volume: 310; Journal Issue: P1; Related Information: CHORUS Timestamp: 2018-09-07 04:59:10; Journal ID: ISSN 1385-8947
Publisher:
Elsevier
Sponsoring Org:
USDOE
Country of Publication:
Switzerland
Language:
English
OSTI Identifier:
1398696

Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, and Biswas, Pratim. Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process. Switzerland: N. p., Web. doi:10.1016/j.cej.2016.10.105.
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, & Biswas, Pratim. Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process. Switzerland. doi:10.1016/j.cej.2016.10.105.
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, and Biswas, Pratim. 2017. "Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process". Switzerland. doi:10.1016/j.cej.2016.10.105.
@article{osti_1398696,
title = {Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process},
author = {Chadha, Tandeep S. and Yang, Mengmeng and Haddad, Kelsey and Shah, Vivek B. and Li, Shuiqing and Biswas, Pratim},
abstractNote = {},
doi = {10.1016/j.cej.2016.10.105},
journal = {Chemical Engineering Journal},
number = P1,
volume = 310,
place = {Switzerland},
year = {2017},
month = {2}
}