Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1398696
- Grant/Contract Number:
- DE AC36-08G028308; IUSSTF/JCERDC-SERIIUS/2012
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Chemical Engineering Journal
- Additional Journal Information:
- Journal Name: Chemical Engineering Journal Journal Volume: 310 Journal Issue: P1; Journal ID: ISSN 1385-8947
- Publisher:
- Elsevier
- Country of Publication:
- Switzerland
- Language:
- English
Citation Formats
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, and Biswas, Pratim. Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process. Switzerland: N. p., 2017.
Web. doi:10.1016/j.cej.2016.10.105.
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, & Biswas, Pratim. Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process. Switzerland. https://doi.org/10.1016/j.cej.2016.10.105
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, and Biswas, Pratim. Wed .
"Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process". Switzerland. https://doi.org/10.1016/j.cej.2016.10.105.
@article{osti_1398696,
title = {Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process},
author = {Chadha, Tandeep S. and Yang, Mengmeng and Haddad, Kelsey and Shah, Vivek B. and Li, Shuiqing and Biswas, Pratim},
abstractNote = {},
doi = {10.1016/j.cej.2016.10.105},
journal = {Chemical Engineering Journal},
number = P1,
volume = 310,
place = {Switzerland},
year = {Wed Feb 01 00:00:00 EST 2017},
month = {Wed Feb 01 00:00:00 EST 2017}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.cej.2016.10.105
https://doi.org/10.1016/j.cej.2016.10.105
Other availability
Cited by: 9 works
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