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This content will become publicly available on May 25, 2018

Title: Hole trapping in amorphous HfO 2 and Al 2 O 3 as a source of positive charging

Authors:
; ; ;
Publication Date:
Grant/Contract Number:
AC02-06CH11357
Type:
Publisher's Accepted Manuscript
Journal Name:
Microelectronic Engineering
Additional Journal Information:
Journal Volume: 178; Journal Issue: C; Related Information: CHORUS Timestamp: 2017-10-04 21:32:40; Journal ID: ISSN 0167-9317
Publisher:
Elsevier
Sponsoring Org:
USDOE
Country of Publication:
Netherlands
Language:
English
OSTI Identifier:
1397659