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Title: Stability of Eshelby dislocations in FCC crystalline nanowires

Authors:
ORCiD logo;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1396609
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
International Journal of Plasticity
Additional Journal Information:
Journal Name: International Journal of Plasticity Journal Volume: 86 Journal Issue: C; Journal ID: ISSN 0749-6419
Publisher:
Elsevier
Country of Publication:
United States
Language:
English

Citation Formats

Ryu, Seunghwa, and Cai, Wei. Stability of Eshelby dislocations in FCC crystalline nanowires. United States: N. p., 2016. Web. doi:10.1016/j.ijplas.2016.07.012.
Ryu, Seunghwa, & Cai, Wei. Stability of Eshelby dislocations in FCC crystalline nanowires. United States. https://doi.org/10.1016/j.ijplas.2016.07.012
Ryu, Seunghwa, and Cai, Wei. Tue . "Stability of Eshelby dislocations in FCC crystalline nanowires". United States. https://doi.org/10.1016/j.ijplas.2016.07.012.
@article{osti_1396609,
title = {Stability of Eshelby dislocations in FCC crystalline nanowires},
author = {Ryu, Seunghwa and Cai, Wei},
abstractNote = {},
doi = {10.1016/j.ijplas.2016.07.012},
journal = {International Journal of Plasticity},
number = C,
volume = 86,
place = {United States},
year = {Tue Nov 01 00:00:00 EDT 2016},
month = {Tue Nov 01 00:00:00 EDT 2016}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.ijplas.2016.07.012

Citation Metrics:
Cited by: 2 works
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