Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors

Humayun, Md Tanim; Sainato, Michela; Divan, Ralu; Rosenberg, Richard A.; Sahagun, Alvaro; Gundel, Lara; Solomon, Paul A.; Paprotny, Igor

doi:10.1116/1.4993579

Title: Effects of O₂ plasma and UV-O₃ assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH₄ sensors

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Abstract

The authors present a comparative analysis of ultraviolet-O₃ (UVO) and O₂ plasma-based surface activation processes of multiwalled carbon nanotubes (MWCNTs), enabling highly effective functionalization with metal oxide nanocrystals (MONCs). Experimental results from transmission electron microscopy, scanning electron microscopy, x-ray photoelectron spectroscopy, and Raman spectroscopy show that by forming COOH (carboxyl), C-OH (hydroxyl), and C=O (carbonyl) groups on the MWCNT surface that act as active nucleation sites, O₂ plasma and UVO-based dry pretreatment techniques greatly enhance the affinity between the MWCNT surface and the functionalizing MONCs. MONCs, such as ZnO and SnO₂, deposited by the atomic layer deposition technique, were implemented as the functionalizing material following UVO and O₂ plasma activation of MWCNTs. A comparative study on the relative resistance changes of O₂ plasma and UVO activated MWCNT functionalized with MONC in the presence of 10 ppm methane (CH₄) in air is presented as well.

Authors:

Humayun, Md Tanim ^[1]; Sainato, Michela ^[1]; Divan, Ralu ^[2]; Rosenberg, Richard A. ^[2]; Sahagun, Alvaro ^[1]; Gundel, Lara ^[3]; Solomon, Paul A. ^[4]; Paprotny, Igor ^[1]

Univ. of Illinois, at Chicago, Chicago, IL (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
U.S. Environmental Protection Agency, Las Vegas, NV (United States)

Publication Date:: Fri Jul 28 00:00:00 EDT 2017

Research Org.:: Argonne National Lab. (ANL), Argonne, IL (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22), Scientific User Facilities Division

OSTI Identifier:: 1393949

Alternate Identifier(s):: OSTI ID: 1532266

Grant/Contract Number:: AC02-06CH11357; AC02-05CH11231

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

Additional Journal Information:: Journal Volume: 35; Journal Issue: 6; Journal ID: ISSN 0734-2101

Publisher:: American Vacuum Society

Country of Publication:: United States

Language:: English

Subject:: 47 OTHER INSTRUMENTATION; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 54 ENVIRONMENTAL SCIENCES; Carbon Nanotube; Gas sensor; Methane

Citation Formats


                    Humayun, Md Tanim, Sainato, Michela, Divan, Ralu, Rosenberg, Richard A., Sahagun, Alvaro, Gundel, Lara, Solomon, Paul A., and Paprotny, Igor. Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors.  United States: N. p., 2017. 
Web.  doi:10.1116/1.4993579.

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                    Humayun, Md Tanim, Sainato, Michela, Divan, Ralu, Rosenberg, Richard A., Sahagun, Alvaro, Gundel, Lara, Solomon, Paul A., & Paprotny, Igor. Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors.  United States.  https://doi.org/10.1116/1.4993579

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                    Humayun, Md Tanim, Sainato, Michela, Divan, Ralu, Rosenberg, Richard A., Sahagun, Alvaro, Gundel, Lara, Solomon, Paul A., and Paprotny, Igor. Fri .  
"Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors".  United States.  https://doi.org/10.1116/1.4993579.  https://www.osti.gov/servlets/purl/1393949.

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@article{osti_1393949,

  title        = {Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors},

  author       = {Humayun, Md Tanim and Sainato, Michela and Divan, Ralu and Rosenberg, Richard A. and Sahagun, Alvaro and Gundel, Lara and Solomon, Paul A. and Paprotny, Igor},

  abstractNote = {The authors present a comparative analysis of ultraviolet-O3 (UVO) and O2 plasma-based surface activation processes of multiwalled carbon nanotubes (MWCNTs), enabling highly effective functionalization with metal oxide nanocrystals (MONCs). Experimental results from transmission electron microscopy, scanning electron microscopy, x-ray photoelectron spectroscopy, and Raman spectroscopy show that by forming COOH (carboxyl), C-OH (hydroxyl), and C=O (carbonyl) groups on the MWCNT surface that act as active nucleation sites, O2 plasma and UVO-based dry pretreatment techniques greatly enhance the affinity between the MWCNT surface and the functionalizing MONCs. MONCs, such as ZnO and SnO2, deposited by the atomic layer deposition technique, were implemented as the functionalizing material following UVO and O2 plasma activation of MWCNTs. A comparative study on the relative resistance changes of O2 plasma and UVO activated MWCNT functionalized with MONC in the presence of 10 ppm methane (CH4) in air is presented as well.},

  doi          = {10.1116/1.4993579},

  journal      = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},

  number       = 6,

  volume       = 35,

  place        = {United States},

  year         = {Fri Jul 28 00:00:00 EDT 2017},

  month        = {Fri Jul 28 00:00:00 EDT 2017}

}

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Title: Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors

Abstract

Citation Formats

Title: Effects of O₂ plasma and UV-O₃ assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH₄ sensors