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Title: Precision Control of the Electron Longitudinal Bunch Shape Using an Emittance-Exchange Beam Line

Here, we report on the experimental generation of relativistic electron bunches with a tunable longitudinal bunch shape. A longitudinal bunch-shaping (LBS) beam line, consisting of a transverse mask followed by a transverse-to-longitudinal emittance exchange (EEX) beam line, is used to tailor the longitudinal bunch shape (or current profile) of the electron bunch. The mask shapes the bunch’s horizontal profile, and the EEX beam line converts it to a corresponding longitudinal profile. The Argonne wakefield accelerator rf photoinjector delivers electron bunches into a LBS beam line to generate a variety of longitudinal bunch shapes. The quality of the longitudinal bunch shape is limited by various perturbations in the exchange process. We develop a simple method, based on the incident slope of the bunch, to significantly suppress the perturbations.
 [1] ;  [1] ;  [1] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [3] ;  [4]
  1. POSTECH, Gyeongbuk (Republic of Korea)
  2. Argonne National Lab. (ANL), Argonne, IL (United States)
  3. Euclid TechLabs, Solon, OH (United States)
  4. Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States)
Publication Date:
Grant/Contract Number:
Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 118; Journal Issue: 10; Journal ID: ISSN 0031-9007
American Physical Society (APS)
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
Pohang University of Science and Technology (POSTECH); Argonne National Laboratory, Advanced Photon Source; USDOE
Country of Publication:
United States
43 PARTICLE ACCELERATORS; electron longitudinal; emittance exchange beamline
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1346593