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Title: Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers

Authors:
 [1] ;  [2] ;  [2] ;  [1]
  1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
  2. Fraunhofer Institute for Material and Beam Technology, Winterbergstraße 28, 01277 Dresden, Germany
Publication Date:
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 122; Journal Issue: 11; Related Information: CHORUS Timestamp: 2018-02-14 20:20:41; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1392731

Voronov, D. L., Gawlitza, P., Braun, S., and Padmore, H. A.. Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers. United States: N. p., Web. doi:10.1063/1.4991377.
Voronov, D. L., Gawlitza, P., Braun, S., & Padmore, H. A.. Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers. United States. doi:10.1063/1.4991377.
Voronov, D. L., Gawlitza, P., Braun, S., and Padmore, H. A.. 2017. "Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers". United States. doi:10.1063/1.4991377.
@article{osti_1392731,
title = {Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers},
author = {Voronov, D. L. and Gawlitza, P. and Braun, S. and Padmore, H. A.},
abstractNote = {},
doi = {10.1063/1.4991377},
journal = {Journal of Applied Physics},
number = 11,
volume = 122,
place = {United States},
year = {2017},
month = {9}
}