Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1392693
- Resource Type:
- Published Article
- Journal Name:
- Optical Materials
- Additional Journal Information:
- Journal Name: Optical Materials Journal Volume: 66 Journal Issue: C; Journal ID: ISSN 0925-3467
- Publisher:
- Elsevier
- Country of Publication:
- Netherlands
- Language:
- English
Citation Formats
Weigel, P. O., and Mookherjea, S. Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips. Netherlands: N. p., 2017.
Web. doi:10.1016/j.optmat.2017.03.014.
Weigel, P. O., & Mookherjea, S. Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips. Netherlands. https://doi.org/10.1016/j.optmat.2017.03.014
Weigel, P. O., and Mookherjea, S. Sat .
"Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips". Netherlands. https://doi.org/10.1016/j.optmat.2017.03.014.
@article{osti_1392693,
title = {Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips},
author = {Weigel, P. O. and Mookherjea, S.},
abstractNote = {},
doi = {10.1016/j.optmat.2017.03.014},
journal = {Optical Materials},
number = C,
volume = 66,
place = {Netherlands},
year = {Sat Apr 01 00:00:00 EDT 2017},
month = {Sat Apr 01 00:00:00 EDT 2017}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.optmat.2017.03.014
https://doi.org/10.1016/j.optmat.2017.03.014
Other availability
Cited by: 6 works
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