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Title: Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips

Authors:
;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1392693
Resource Type:
Published Article
Journal Name:
Optical Materials
Additional Journal Information:
Journal Name: Optical Materials Journal Volume: 66 Journal Issue: C; Journal ID: ISSN 0925-3467
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Weigel, P. O., and Mookherjea, S. Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips. Netherlands: N. p., 2017. Web. doi:10.1016/j.optmat.2017.03.014.
Weigel, P. O., & Mookherjea, S. Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips. Netherlands. doi:10.1016/j.optmat.2017.03.014.
Weigel, P. O., and Mookherjea, S. Sat . "Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips". Netherlands. doi:10.1016/j.optmat.2017.03.014.
@article{osti_1392693,
title = {Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips},
author = {Weigel, P. O. and Mookherjea, S.},
abstractNote = {},
doi = {10.1016/j.optmat.2017.03.014},
journal = {Optical Materials},
number = C,
volume = 66,
place = {Netherlands},
year = {2017},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.optmat.2017.03.014

Citation Metrics:
Cited by: 3 works
Citation information provided by
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