Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips

doi:10.1016/j.optmat.2017.03.014

Title: Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips

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Authors:: Weigel, P. O.; Mookherjea, S.

Publication Date:: 2017-04-01

Sponsoring Org.:: USDOE

OSTI Identifier:: 1392693

Resource Type:: Published Article

Journal Name:: Optical Materials

Additional Journal Information:: Journal Name: Optical Materials Journal Volume: 66 Journal Issue: C; Journal ID: ISSN 0925-3467

Publisher:: Elsevier

Country of Publication:: Netherlands

Language:: English

Citation Formats


                    Weigel, P. O., and Mookherjea, S. Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips.  Netherlands: N. p., 2017. 
        Web.  doi:10.1016/j.optmat.2017.03.014.

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                    Weigel, P. O., & Mookherjea, S. Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips.  Netherlands.  doi:10.1016/j.optmat.2017.03.014.

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                    Weigel, P. O., and Mookherjea, S. Sat .  
        "Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips".  Netherlands.  doi:10.1016/j.optmat.2017.03.014.

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@article{osti_1392693,

  title        = {Reducing the thermal stress in a heterogeneous material stack for large-area hybrid optical silicon-lithium niobate waveguide micro-chips},

  author       = {Weigel, P. O. and Mookherjea, S.},

  abstractNote = {},

  doi          = {10.1016/j.optmat.2017.03.014},

  journal      = {Optical Materials},

  number       = C,

  volume       = 66,

  place        = {Netherlands},

  year         = {2017},

  month        = {4}

}

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DOI: 10.1016/j.optmat.2017.03.014

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