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Title: Sub-Micrometer Zeolite Films on Gold-Coated Silicon Wafers with Single-Crystal-Like Dielectric Constant and Elastic Modulus

Abstract

A low-temperature synthesis coupled with mild activation produces zeolite films exhibiting low dielectric constant (low-k) matching the theoretically predicted and experimentally measured values for single crystals. This synthesis and activation method allows for the fabrication of a device consisting of a b-oriented film of the pure-silica zeolite MFI (silicalite-1) supported on a gold-coated silicon wafer. The zeolite seeds are assembled by a manual assembly process and subjected to optimized secondary growth conditions that do not cause corrosion of the gold underlayer, while strongly promoting in-plane growth. The traditional calcination process is replaced with a nonthermal photochemical activation to ensure preservation of an intact gold layer. The dielectric constant (k), obtained through measurement of electrical capacitance in a metal–insulator–metal configuration, highlights the ultralow k ≈ 1.7 of the synthetized films, which is among the lowest values reported for an MFI film. There is large improvement in elastic modulus of the film (E ≈ 54 GPa) over previous reports, potentially allowing for integration into silicon wafer processing technology.

Authors:
 [1];  [2];  [2];  [2];  [2];  [3];  [4];  [2];  [2];  [5];  [1];  [2]
  1. Univ. Magna Graecia of Catanzaro, Viale Europa, Catanzaro (Italy). Dept. of Medical and Surgical Sciences
  2. Univ. of Minnesota, Minneapolis, MN (United States). Dept. of Chemical Engineering and Materials Science
  3. Univ. of Minnesota, Minneapolis, MN (United States). Characterization Facility
  4. Argonne National Lab. (ANL), Argonne, IL (United States). Surface Scattering and Microdiffraction, X-ray Science Division
  5. Univ. Magna Graecia of Catanzaro, Viale Europa Catanzaro (Italy). Dept. of Health Sciences
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Center for Gas Separations Relevant to Clean Energy Technologies (CGS)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1389008
Alternate Identifier(s):
OSTI ID: 1401081
Grant/Contract Number:  
SC0001015; AC02-06CH11357; FG02-12ER16362
Resource Type:
Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Volume: 27; Journal Issue: 25; Related Information: CGS partners with University of California, Berkeley; University of California, Davis; Lawrence Berkeley National Laboratory; University of Minnesota; National Energy Technology Laboratory; Texas A&M University; Journal ID: ISSN 1616-301X
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; membrane; carbon capture; materials and chemistry by design; synthesis (novel materials); synthesis (self-assembly); synthesis (scalable processing); zeolites; low-k; dielectrics; UV treatment; synchrotron XRD

Citation Formats

Tiriolo, Raffaele, Rangnekar, Neel, Zhang, Han, Shete, Meera, Bai, Peng, Nelson, John, Karapetrova, Evguenia, Macosko, Christopher W., Siepmann, Joern Ilja, Lamanna, Ernesto, Lavano, Angelo, and Tsapatsis, Michael. Sub-Micrometer Zeolite Films on Gold-Coated Silicon Wafers with Single-Crystal-Like Dielectric Constant and Elastic Modulus. United States: N. p., 2017. Web. doi:10.1002/adfm.201700864.
Tiriolo, Raffaele, Rangnekar, Neel, Zhang, Han, Shete, Meera, Bai, Peng, Nelson, John, Karapetrova, Evguenia, Macosko, Christopher W., Siepmann, Joern Ilja, Lamanna, Ernesto, Lavano, Angelo, & Tsapatsis, Michael. Sub-Micrometer Zeolite Films on Gold-Coated Silicon Wafers with Single-Crystal-Like Dielectric Constant and Elastic Modulus. United States. doi:10.1002/adfm.201700864.
Tiriolo, Raffaele, Rangnekar, Neel, Zhang, Han, Shete, Meera, Bai, Peng, Nelson, John, Karapetrova, Evguenia, Macosko, Christopher W., Siepmann, Joern Ilja, Lamanna, Ernesto, Lavano, Angelo, and Tsapatsis, Michael. Mon . "Sub-Micrometer Zeolite Films on Gold-Coated Silicon Wafers with Single-Crystal-Like Dielectric Constant and Elastic Modulus". United States. doi:10.1002/adfm.201700864. https://www.osti.gov/servlets/purl/1389008.
@article{osti_1389008,
title = {Sub-Micrometer Zeolite Films on Gold-Coated Silicon Wafers with Single-Crystal-Like Dielectric Constant and Elastic Modulus},
author = {Tiriolo, Raffaele and Rangnekar, Neel and Zhang, Han and Shete, Meera and Bai, Peng and Nelson, John and Karapetrova, Evguenia and Macosko, Christopher W. and Siepmann, Joern Ilja and Lamanna, Ernesto and Lavano, Angelo and Tsapatsis, Michael},
abstractNote = {A low-temperature synthesis coupled with mild activation produces zeolite films exhibiting low dielectric constant (low-k) matching the theoretically predicted and experimentally measured values for single crystals. This synthesis and activation method allows for the fabrication of a device consisting of a b-oriented film of the pure-silica zeolite MFI (silicalite-1) supported on a gold-coated silicon wafer. The zeolite seeds are assembled by a manual assembly process and subjected to optimized secondary growth conditions that do not cause corrosion of the gold underlayer, while strongly promoting in-plane growth. The traditional calcination process is replaced with a nonthermal photochemical activation to ensure preservation of an intact gold layer. The dielectric constant (k), obtained through measurement of electrical capacitance in a metal–insulator–metal configuration, highlights the ultralow k ≈ 1.7 of the synthetized films, which is among the lowest values reported for an MFI film. There is large improvement in elastic modulus of the film (E ≈ 54 GPa) over previous reports, potentially allowing for integration into silicon wafer processing technology.},
doi = {10.1002/adfm.201700864},
journal = {Advanced Functional Materials},
number = 25,
volume = 27,
place = {United States},
year = {2017},
month = {5}
}

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