Atomic Layer Deposition of the Solid Electrolyte LiPON
Abstract
We demonstrate an atomic layer deposition (ALD) process for the solid electrolyte lithium phosphorousoxynitride (LiPON) using lithium tert-butoxide (LiOtBu), H2O, trimethylphosphate (TMP), and plasma N2 (PN2) as precursors. We use in-situ spectroscopic ellipsometry to determine growth rates for process optimization to design a rational, quaternary precursor ALD process where only certain substrate–precursor chemical reactions are favorable. We demonstrate via in-situ XPS tunable nitrogen incorporation into the films by variation of the PN2 dose and find that ALD films over approximately 4.5% nitrogen are amorphous, whereas LiPON ALD films with less than 4.5% nitrogen are polycrystalline. Lastly, we characterize the ionic conductivity of the ALD films as a function of nitrogen content and demonstrate their functionality on a model battery electrode—a Si anode on a Cu current collector.
- Authors:
-
- Department of Materials Science & Engineering and ‡Institute for Systems Research, University of Maryland, College Park, Maryland 20742, United States
- Publication Date:
- Research Org.:
- Energy Frontier Research Centers (EFRC) (United States). Nanostructures for Electrical Energy Storage (NEES)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1206791
- Alternate Identifier(s):
- OSTI ID: 1385989
- Grant/Contract Number:
- SC0001160
- Resource Type:
- Published Article
- Journal Name:
- Chemistry of Materials
- Additional Journal Information:
- Journal Name: Chemistry of Materials Journal Volume: 27 Journal Issue: 15; Journal ID: ISSN 0897-4756
- Publisher:
- American Chemical Society
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; bio-inspired; energy storage (including batteries and capacitors); defects; charge transport; synthesis (novel materials); synthesis (self-assembly); synthesis (scalable processing)
Citation Formats
Kozen, Alexander C., Pearse, Alexander J., Lin, Chuan-Fu, Noked, Malachi, and Rubloff, Gary W. Atomic Layer Deposition of the Solid Electrolyte LiPON. United States: N. p., 2015.
Web. doi:10.1021/acs.chemmater.5b01654.
Kozen, Alexander C., Pearse, Alexander J., Lin, Chuan-Fu, Noked, Malachi, & Rubloff, Gary W. Atomic Layer Deposition of the Solid Electrolyte LiPON. United States. https://doi.org/10.1021/acs.chemmater.5b01654
Kozen, Alexander C., Pearse, Alexander J., Lin, Chuan-Fu, Noked, Malachi, and Rubloff, Gary W. Thu .
"Atomic Layer Deposition of the Solid Electrolyte LiPON". United States. https://doi.org/10.1021/acs.chemmater.5b01654.
@article{osti_1206791,
title = {Atomic Layer Deposition of the Solid Electrolyte LiPON},
author = {Kozen, Alexander C. and Pearse, Alexander J. and Lin, Chuan-Fu and Noked, Malachi and Rubloff, Gary W.},
abstractNote = {We demonstrate an atomic layer deposition (ALD) process for the solid electrolyte lithium phosphorousoxynitride (LiPON) using lithium tert-butoxide (LiOtBu), H2O, trimethylphosphate (TMP), and plasma N2 (PN2) as precursors. We use in-situ spectroscopic ellipsometry to determine growth rates for process optimization to design a rational, quaternary precursor ALD process where only certain substrate–precursor chemical reactions are favorable. We demonstrate via in-situ XPS tunable nitrogen incorporation into the films by variation of the PN2 dose and find that ALD films over approximately 4.5% nitrogen are amorphous, whereas LiPON ALD films with less than 4.5% nitrogen are polycrystalline. Lastly, we characterize the ionic conductivity of the ALD films as a function of nitrogen content and demonstrate their functionality on a model battery electrode—a Si anode on a Cu current collector.},
doi = {10.1021/acs.chemmater.5b01654},
journal = {Chemistry of Materials},
number = 15,
volume = 27,
place = {United States},
year = {Thu Jul 30 00:00:00 EDT 2015},
month = {Thu Jul 30 00:00:00 EDT 2015}
}
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https://doi.org/10.1021/acs.chemmater.5b01654
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