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Title: Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films

Abstract

Low‐loss magnetization dynamics and strong magnetoelastic coupling are generally mutually exclusive properties due to opposing dependencies on spin–orbit interactions. So far, the lack of low‐damping, magnetostrictive ferrite films has hindered the development of power‐efficient magnetoelectric and acoustic spintronic devices. Here, magnetically soft epitaxial spinel NiZnAl‐ferrite thin films with an unusually low Gilbert damping parameter (<3 × 10 −3 ), as well as strong magnetoelastic coupling evidenced by a giant strain‐induced anisotropy field (≈1 T) and a sizable magnetostriction coefficient (≈10 ppm), are reported. This exceptional combination of low intrinsic damping and substantial magnetostriction arises from the cation chemistry of NiZnAl‐ferrite. At the same time, the coherently strained film structure suppresses extrinsic damping, enables soft magnetic behavior, and generates large easy‐plane magnetoelastic anisotropy. These findings provide a foundation for a new class of low‐loss, magnetoelastic thin film materials that are promising for spin‐mechanical devices.

Authors:
ORCiD logo [1];  [2];  [3];  [2];  [2];  [2];  [2];  [2];  [1];  [1];  [1];  [4];  [4];  [4];  [5];  [6];  [6];  [7];  [7];  [7] more »;  [8];  [8];  [9];  [1];  [2] « less
  1. Geballe Laboratory for Advanced Materials Stanford University Stanford CA 94305 USA
  2. Materials and Manufacturing Directorate Air Force Research Laboratory WPAFB OH 45433 USA
  3. Department of Electrical Engineering Wright State University Dayton OH 45431 USA
  4. Advanced Light Source Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
  5. College of Science and Engineering Characterization Facility University of Minnesota Minneapolis MN 55455 USA
  6. Department of Physics The Ohio State University Columbus OH 43210 USA
  7. Department of Materials Science and Engineering University of Illinois Urbana IL 61801 USA
  8. Department of Electrical Engineering and Computer Science Oregon State University Corvallis OR 97331 USA
  9. Department of Electrical Engineering Northeastern University Boston MA 02115 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1380025
Grant/Contract Number:  
DE‐AC02‐05CH11231
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials Journal Volume: 29 Journal Issue: 34; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Emori, Satoru, Gray, Benjamin A., Jeon, Hyung‐Min, Peoples, Joseph, Schmitt, Maxwell, Mahalingam, Krishnamurthy, Hill, Madelyn, McConney, Michael E., Gray, Matthew T., Alaan, Urusa S., Bornstein, Alexander C., Shafer, Padraic, N'Diaye, Alpha T., Arenholz, Elke, Haugstad, Greg, Meng, Keng‐Yuan, Yang, Fengyuan, Li, Dongyao, Mahat, Sushant, Cahill, David G., Dhagat, Pallavi, Jander, Albrecht, Sun, Nian X., Suzuki, Yuri, and Howe, Brandon M. Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films. Germany: N. p., 2017. Web. doi:10.1002/adma.201701130.
Emori, Satoru, Gray, Benjamin A., Jeon, Hyung‐Min, Peoples, Joseph, Schmitt, Maxwell, Mahalingam, Krishnamurthy, Hill, Madelyn, McConney, Michael E., Gray, Matthew T., Alaan, Urusa S., Bornstein, Alexander C., Shafer, Padraic, N'Diaye, Alpha T., Arenholz, Elke, Haugstad, Greg, Meng, Keng‐Yuan, Yang, Fengyuan, Li, Dongyao, Mahat, Sushant, Cahill, David G., Dhagat, Pallavi, Jander, Albrecht, Sun, Nian X., Suzuki, Yuri, & Howe, Brandon M. Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films. Germany. https://doi.org/10.1002/adma.201701130
Emori, Satoru, Gray, Benjamin A., Jeon, Hyung‐Min, Peoples, Joseph, Schmitt, Maxwell, Mahalingam, Krishnamurthy, Hill, Madelyn, McConney, Michael E., Gray, Matthew T., Alaan, Urusa S., Bornstein, Alexander C., Shafer, Padraic, N'Diaye, Alpha T., Arenholz, Elke, Haugstad, Greg, Meng, Keng‐Yuan, Yang, Fengyuan, Li, Dongyao, Mahat, Sushant, Cahill, David G., Dhagat, Pallavi, Jander, Albrecht, Sun, Nian X., Suzuki, Yuri, and Howe, Brandon M. Mon . "Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films". Germany. https://doi.org/10.1002/adma.201701130.
@article{osti_1380025,
title = {Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films},
author = {Emori, Satoru and Gray, Benjamin A. and Jeon, Hyung‐Min and Peoples, Joseph and Schmitt, Maxwell and Mahalingam, Krishnamurthy and Hill, Madelyn and McConney, Michael E. and Gray, Matthew T. and Alaan, Urusa S. and Bornstein, Alexander C. and Shafer, Padraic and N'Diaye, Alpha T. and Arenholz, Elke and Haugstad, Greg and Meng, Keng‐Yuan and Yang, Fengyuan and Li, Dongyao and Mahat, Sushant and Cahill, David G. and Dhagat, Pallavi and Jander, Albrecht and Sun, Nian X. and Suzuki, Yuri and Howe, Brandon M.},
abstractNote = {Low‐loss magnetization dynamics and strong magnetoelastic coupling are generally mutually exclusive properties due to opposing dependencies on spin–orbit interactions. So far, the lack of low‐damping, magnetostrictive ferrite films has hindered the development of power‐efficient magnetoelectric and acoustic spintronic devices. Here, magnetically soft epitaxial spinel NiZnAl‐ferrite thin films with an unusually low Gilbert damping parameter (<3 × 10 −3 ), as well as strong magnetoelastic coupling evidenced by a giant strain‐induced anisotropy field (≈1 T) and a sizable magnetostriction coefficient (≈10 ppm), are reported. This exceptional combination of low intrinsic damping and substantial magnetostriction arises from the cation chemistry of NiZnAl‐ferrite. At the same time, the coherently strained film structure suppresses extrinsic damping, enables soft magnetic behavior, and generates large easy‐plane magnetoelastic anisotropy. These findings provide a foundation for a new class of low‐loss, magnetoelastic thin film materials that are promising for spin‐mechanical devices.},
doi = {10.1002/adma.201701130},
journal = {Advanced Materials},
number = 34,
volume = 29,
place = {Germany},
year = {Mon Jul 10 00:00:00 EDT 2017},
month = {Mon Jul 10 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
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https://doi.org/10.1002/adma.201701130

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Cited by: 54 works
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