Quantitative microstructural imaging by scanning Laue x-ray micro- and nanodiffraction

Chen, Xian; Dejoie, Catherine; Jiang, Tengfei; Ku, Ching-Shun; Tamura, Nobumichi

doi:10.1557/mrs.2016.97

Title: Quantitative microstructural imaging by scanning Laue x-ray micro- and nanodiffraction

Journal Article · 08 June 2016 · MRS Bulletin

DOI: https://doi.org/10.1557/mrs.2016.97 · OSTI ID:1379389

Chen, Xian ^[1]; Dejoie, Catherine ^[2]; Jiang, Tengfei ^[3]; Ku, Ching-Shun ^[4]; Tamura, Nobumichi ^[5]

Hong Kong University of Science and Technology (China). Department of Mechanical and Aerospace Engineering
ETH Zurich (Switzerland). Department of Materials
Univ. of Central Florida, Orlando, FL (United States). Department of Materials Science and Engineering and Advanced Materials Processing and Analysis Center
National Synchrotron Radiation Research Center (Taiwan). Scientific Research Division
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)

We present that local crystal structure, crystal orientation, and crystal deformation can all be probed by Laue diffraction using a submicron x-ray beam. This technique, employed at a synchrotron facility, is particularly suitable for fast mapping the mechanical and microstructural properties of inhomogeneous multiphase polycrystalline samples, as well as imperfect epitaxial films or crystals. As synchrotron Laue x-ray microdiffraction enters its 20th year of existence and new synchrotron nanoprobe facilities are being built and commissioned around the world, we take the opportunity to overview current capabilities as well as the latest technical developments. Fast data collection provided by state-of-the-art area detectors and fully automated pattern indexing algorithms optimized for speed make it possible to map large portions of a sample with fine step size and obtain quantitative images of its microstructure in near real time. Lastly, we extrapolate how the technique is anticipated to evolve in the near future and its potential emerging applications at a free-electron laser facility.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1379389

Journal Information:: MRS Bulletin, Vol. 41, Issue 06; ISSN 0883-7694

Publisher:: Materials Research SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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