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This content will become publicly available on September 5, 2018

Title: Atomic level cleaning of poly-methyl-methacrylate residues from the graphene surface using radiolized water at high temperatures

Authors:
ORCiD logo [1] ;  [2] ;  [3] ; ORCiD logo [1] ;  [4] ; ORCiD logo [2] ;  [4]
  1. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433, USA, Biological and Nanoscale Technologies, UES, Inc., Beavercreek, Ohio 45432, USA
  2. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
  3. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433, USA, National Research Council, Washington, District of Columbia 20001, USA
  4. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433, USA
Publication Date:
Grant/Contract Number:
SC0012704
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 111; Journal Issue: 10; Related Information: CHORUS Timestamp: 2018-02-14 19:56:29; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1378392