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Title: Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is a promising approach for sub-10-nm surface patterning. DSA requires the control of interfacial properties on both interfaces of a BCP film to induce the formation of domains that traverse the entire film with a perpendicular orientation. Here we show a methodology to control the interfacial properties of BCP films that uses a polymer topcoat deposited by initiated chemical vapour deposition (iCVD). The iCVD topcoat forms a crosslinked network that grafts to and immobilizes BCP chains to create an interface that is equally attractive to both blocks of the underlying copolymer. The topcoat, in conjunction with a chemically patterned substrate, directs the assembly of the grating structures in BCP films with a half-pitch dimension of 9.3 nm. As the iCVD topcoat can be as thin as 7 nm, it is amenable to pattern transfer without removal. As a result, the ease of vapour-phase deposition, applicability to high-resolution BCP systems and integration with pattern-transfer schemes are attractive properties of iCVD topcoats for industrial applications.
Authors:
 [1] ;  [2] ;  [2] ;  [1] ; ORCiD logo [3] ;  [3] ;  [2] ;  [1]
  1. Univ. of Chicago, Chicago, IL (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
  2. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
  3. Argonne National Lab. (ANL), Argonne, IL (United States)
Publication Date:
Grant/Contract Number:
AC02-06CH11357
Type:
Accepted Manuscript
Journal Name:
Nature Nanotechnology
Additional Journal Information:
Journal Volume: 12; Journal Issue: 6; Journal ID: ISSN 1748-3387
Publisher:
Nature Publishing Group
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22), Materials Sciences and Engineering Division; National Science Foundation (NSF); U.S. Army Research Laboratory - U.S. Army Research Office (ARO)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE
OSTI Identifier:
1373307

Suh, Hyo Seon, Kim, Do Han, Moni, Priya, Xiong, Shisheng, Ocola, Leonidas E., Zaluzec, Nestor J., Gleason, Karen K., and Nealey, Paul F.. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat. United States: N. p., Web. doi:10.1038/nnano.2017.34.
Suh, Hyo Seon, Kim, Do Han, Moni, Priya, Xiong, Shisheng, Ocola, Leonidas E., Zaluzec, Nestor J., Gleason, Karen K., & Nealey, Paul F.. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat. United States. doi:10.1038/nnano.2017.34.
Suh, Hyo Seon, Kim, Do Han, Moni, Priya, Xiong, Shisheng, Ocola, Leonidas E., Zaluzec, Nestor J., Gleason, Karen K., and Nealey, Paul F.. 2017. "Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat". United States. doi:10.1038/nnano.2017.34. https://www.osti.gov/servlets/purl/1373307.
@article{osti_1373307,
title = {Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat},
author = {Suh, Hyo Seon and Kim, Do Han and Moni, Priya and Xiong, Shisheng and Ocola, Leonidas E. and Zaluzec, Nestor J. and Gleason, Karen K. and Nealey, Paul F.},
abstractNote = {Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is a promising approach for sub-10-nm surface patterning. DSA requires the control of interfacial properties on both interfaces of a BCP film to induce the formation of domains that traverse the entire film with a perpendicular orientation. Here we show a methodology to control the interfacial properties of BCP films that uses a polymer topcoat deposited by initiated chemical vapour deposition (iCVD). The iCVD topcoat forms a crosslinked network that grafts to and immobilizes BCP chains to create an interface that is equally attractive to both blocks of the underlying copolymer. The topcoat, in conjunction with a chemically patterned substrate, directs the assembly of the grating structures in BCP films with a half-pitch dimension of 9.3 nm. As the iCVD topcoat can be as thin as 7 nm, it is amenable to pattern transfer without removal. As a result, the ease of vapour-phase deposition, applicability to high-resolution BCP systems and integration with pattern-transfer schemes are attractive properties of iCVD topcoats for industrial applications.},
doi = {10.1038/nnano.2017.34},
journal = {Nature Nanotechnology},
number = 6,
volume = 12,
place = {United States},
year = {2017},
month = {3}
}

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