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Title: Reaction of amorphous/crystalline SiOC/Fe interfaces by thermal annealing

Authors:
ORCiD logo [1];  [2];  [3];  [3];  [4];  [5];  [6];  [3];  [3]; ORCiD logo [1]
  1. Univ. of Nebraska, Lincoln, NE (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States)
  3. Texas A & M Univ., College Station, TX (United States)
  4. Argonne National Lab. (ANL), Argonne, IL (United States)
  5. Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
  6. Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Univ. of California, Davis, CA (United States)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States); Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
Argonne National Laboratory, Advanced Photon Source; USDOE Office of Nuclear Energy (NE), Nuclear Energy Enabling Technologies (NEET); National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1372391
Alternate Identifier(s):
OSTI ID: 1392212; OSTI ID: 1550350
Report Number(s):
BNL-114110-2017-JA
Journal ID: ISSN 1359-6454; 136394
Grant/Contract Number:  
AC02-06CH11357; NE0000533; SC0012704; AC52-06NA25396; AC02-05CH11231
Resource Type:
Accepted Manuscript
Journal Name:
Acta Materialia
Additional Journal Information:
Journal Volume: 135; Journal Issue: C; Journal ID: ISSN 1359-6454
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; amorphous silicon oxycarbide; amorphous/crystalline interface; nanocrystalline Fe; thermal stability

Citation Formats

Su, Qing, Zhernenkov, Mikhail, Ding, Hepeng, Price, Lloyd, Haskel, Daniel, Watkins, Erik Benjamin, Majewski, Jaroslaw, Shao, Lin, Demkowicz, Michael J., and Nastasi, Michael. Reaction of amorphous/crystalline SiOC/Fe interfaces by thermal annealing. United States: N. p., 2017. Web. https://doi.org/10.1016/j.actamat.2017.06.020.
Su, Qing, Zhernenkov, Mikhail, Ding, Hepeng, Price, Lloyd, Haskel, Daniel, Watkins, Erik Benjamin, Majewski, Jaroslaw, Shao, Lin, Demkowicz, Michael J., & Nastasi, Michael. Reaction of amorphous/crystalline SiOC/Fe interfaces by thermal annealing. United States. https://doi.org/10.1016/j.actamat.2017.06.020
Su, Qing, Zhernenkov, Mikhail, Ding, Hepeng, Price, Lloyd, Haskel, Daniel, Watkins, Erik Benjamin, Majewski, Jaroslaw, Shao, Lin, Demkowicz, Michael J., and Nastasi, Michael. Mon . "Reaction of amorphous/crystalline SiOC/Fe interfaces by thermal annealing". United States. https://doi.org/10.1016/j.actamat.2017.06.020. https://www.osti.gov/servlets/purl/1372391.
@article{osti_1372391,
title = {Reaction of amorphous/crystalline SiOC/Fe interfaces by thermal annealing},
author = {Su, Qing and Zhernenkov, Mikhail and Ding, Hepeng and Price, Lloyd and Haskel, Daniel and Watkins, Erik Benjamin and Majewski, Jaroslaw and Shao, Lin and Demkowicz, Michael J. and Nastasi, Michael},
abstractNote = {},
doi = {10.1016/j.actamat.2017.06.020},
journal = {Acta Materialia},
number = C,
volume = 135,
place = {United States},
year = {2017},
month = {6}
}

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Cited by: 1 work
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    Works referencing / citing this record:

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    journal, March 2019


    Resistance to Helium Bubble Formation in Amorphous SiOC/Crystalline Fe Nanocomposite
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    Radiation Tolerance in Nano-Structured Crystalline Fe(Cr)/Amorphous SiOC Composite
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