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Title: Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

Authors:
 [1];  [2];  [1];  [1]
  1. Department of Electrical Engineering, University of California, Berkeley, California 94720
  2. Department of Electrical Engineering, University of California, Berkeley, California 94720 and School of Physics and Optoelectronics Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1369497
Grant/Contract Number:  
SC0001939
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology A
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 35 Journal Issue: 5; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Kawamura, Emi, Wen, De-Qi, Lieberman, Michael A., and Lichtenberg, Allan J. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges. United States: N. p., 2017. Web. doi:10.1116/1.4993595.
Kawamura, Emi, Wen, De-Qi, Lieberman, Michael A., & Lichtenberg, Allan J. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges. United States. doi:10.1116/1.4993595.
Kawamura, Emi, Wen, De-Qi, Lieberman, Michael A., and Lichtenberg, Allan J. Fri . "Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges". United States. doi:10.1116/1.4993595.
@article{osti_1369497,
title = {Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges},
author = {Kawamura, Emi and Wen, De-Qi and Lieberman, Michael A. and Lichtenberg, Allan J.},
abstractNote = {},
doi = {10.1116/1.4993595},
journal = {Journal of Vacuum Science and Technology A},
number = 5,
volume = 35,
place = {United States},
year = {2017},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1116/1.4993595

Citation Metrics:
Cited by: 2 works
Citation information provided by
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