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Title: Effect of oxygen vacancies and strain on the phonon spectrum of HfO 2 thin films

Authors:
 [1] ; ORCiD logo [2] ;  [3] ;  [2] ;  [3] ; ORCiD logo [4] ;  [1]
  1. Department of Physics, The University of Texas, Austin, Texas 78712, USA
  2. Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA
  3. Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA
  4. Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA, Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA
Publication Date:
Grant/Contract Number:
DESC0008877
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 121; Journal Issue: 22; Related Information: CHORUS Timestamp: 2018-02-14 11:18:50; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1361920