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Title: H + ion-induced damage and etching of multilayer graphene in H 2 plasmas

Authors:
 [1] ;  [1] ;  [1] ;  [2]
  1. Univ. Grenoble Alpes, CNRS, CEA-Leti Minatec, LTM, 38054 Grenoble Cedex, France
  2. Department of Chemical Engineering, University of California at Berkeley, Berkeley, California 94720, USA
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 121; Journal Issue: 13; Related Information: CHORUS Timestamp: 2018-02-14 20:22:35; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1361793