skip to main content

DOE PAGESDOE PAGES

Title: Substrate noise isolation improvement in a single-well standard CMOS process

Authors:
; ;
Publication Date:
Grant/Contract Number:
UID/EEA/50008/2013; PEst-OE/EEI/LA0008/2014
Type:
Publisher's Accepted Manuscript
Journal Name:
Integration, The VLSI Journal
Additional Journal Information:
Journal Volume: 52; Journal Issue: C; Related Information: CHORUS Timestamp: 2017-05-27 15:56:46; Journal ID: ISSN 0167-9260
Publisher:
Elsevier
Sponsoring Org:
USDOE Office of Nuclear Energy (NE), Fuel Cycle Technologies (NE-5)
Country of Publication:
Netherlands
Language:
English
OSTI Identifier:
1359962