Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering

Watkins, Erik Benjamin; Majewski, Jaroslaw; Baldwin, Jon Kevin Scott; Chen, Youxing; Li, Nan; Hoagland, Richard G.; Yadav, Satyesh K; Liu, Xiang-Yang; Beyerlein, Irene Jane; Mara, Nathan Allan

doi:10.1016/j.tsf.2016.08.064

Title: Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering

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Abstract

We report that nanolayered metal-ceramic composite systems provide the possibility to produce new materials with exceptional strength, toughness, and radiation resistance not exhibited by their individual constituents. The unusual behaviors are frequently attributed to the high density of internal interfaces. Most layered structures studied to date contain sharp interfaces and the synthesis of more diffuse interfacial structures, where the interface is graded out of the interface plane, has not been deeply explored. Here we show how neutron reflectometry was used to study the structure of magnetron sputter deposited titanium and titanium nitride (Ti/TiN) layers as a function of deposition parameters: temperature, rate of N₂ flow or pressure, electrical bias applied to the sample, and orientation of the ion source relative to the sample. These different deposition and post-processing strategies resulted in profound changes in the structure of the interfacial region between the two components in Ti/TiN_x bilayers. Finally, the results show that temperature and low step-wise N₂ flow rates, but not electrical bias, can form graded interfaces in a controlled manner.

Authors:

^[1];

^[2];

^[1];

^[1]; Yadav, Satyesh K ^[1];

^[1]; Beyerlein, Irene Jane ^[1];

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Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Univ. of California, Davis, CA (United States)

Publication Date:: Fri Sep 02 00:00:00 EDT 2016

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program

OSTI Identifier:: 1467325

Alternate Identifier(s):: OSTI ID: 1359952

Report Number(s):: LA-UR-17-24550
Journal ID: ISSN 0040-6090

Grant/Contract Number:: AC52-06NA25396

Resource Type:: Accepted Manuscript

Journal Name:: Thin Solid Films

Additional Journal Information:: Journal Volume: 616; Journal Issue: C; Journal ID: ISSN 0040-6090

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; Titanium; Titanium nitride; Engineered interfaces; Composite materials; Neutron reflectivity

Citation Formats


                    Watkins, Erik Benjamin, Majewski, Jaroslaw, Baldwin, Jon Kevin Scott, Chen, Youxing, Li, Nan, Hoagland, Richard G., Yadav, Satyesh K, Liu, Xiang-Yang, Beyerlein, Irene Jane, and Mara, Nathan Allan. Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering.  United States: N. p., 2016. 
Web.  doi:10.1016/j.tsf.2016.08.064.

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                    Watkins, Erik Benjamin, Majewski, Jaroslaw, Baldwin, Jon Kevin Scott, Chen, Youxing, Li, Nan, Hoagland, Richard G., Yadav, Satyesh K, Liu, Xiang-Yang, Beyerlein, Irene Jane, & Mara, Nathan Allan. Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering.  United States.  https://doi.org/10.1016/j.tsf.2016.08.064

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                    Watkins, Erik Benjamin, Majewski, Jaroslaw, Baldwin, Jon Kevin Scott, Chen, Youxing, Li, Nan, Hoagland, Richard G., Yadav, Satyesh K, Liu, Xiang-Yang, Beyerlein, Irene Jane, and Mara, Nathan Allan. Fri .  
"Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering".  United States.  https://doi.org/10.1016/j.tsf.2016.08.064.  https://www.osti.gov/servlets/purl/1467325.

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@article{osti_1467325,

  title        = {Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering},

  author       = {Watkins, Erik Benjamin and Majewski, Jaroslaw and Baldwin, Jon Kevin Scott and Chen, Youxing and Li, Nan and Hoagland, Richard G. and Yadav, Satyesh K and Liu, Xiang-Yang and Beyerlein, Irene Jane and Mara, Nathan Allan},

  abstractNote = {We report that nanolayered metal-ceramic composite systems provide the possibility to produce new materials with exceptional strength, toughness, and radiation resistance not exhibited by their individual constituents. The unusual behaviors are frequently attributed to the high density of internal interfaces. Most layered structures studied to date contain sharp interfaces and the synthesis of more diffuse interfacial structures, where the interface is graded out of the interface plane, has not been deeply explored. Here we show how neutron reflectometry was used to study the structure of magnetron sputter deposited titanium and titanium nitride (Ti/TiN) layers as a function of deposition parameters: temperature, rate of N2 flow or pressure, electrical bias applied to the sample, and orientation of the ion source relative to the sample. These different deposition and post-processing strategies resulted in profound changes in the structure of the interfacial region between the two components in Ti/TiNx bilayers. Finally, the results show that temperature and low step-wise N2 flow rates, but not electrical bias, can form graded interfaces in a controlled manner.},

  doi          = {10.1016/j.tsf.2016.08.064},

  journal      = {Thin Solid Films},

  number       = C,

  volume       = 616,

  place        = {United States},

  year         = {Fri Sep 02 00:00:00 EDT 2016},

  month        = {Fri Sep 02 00:00:00 EDT 2016}

}

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