Prediction of recrystallization times in electroplated copper thin films
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1359949
- Grant/Contract Number:
- AC02-98CH10886
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Thin Solid Films
- Additional Journal Information:
- Journal Name: Thin Solid Films Journal Volume: 615 Journal Issue: C; Journal ID: ISSN 0040-6090
- Publisher:
- Elsevier
- Country of Publication:
- Netherlands
- Language:
- English
Citation Formats
Treger, Mikhail, Witt, Christian, Cabral, Jr., Cyril, Murray, Conal, Jordan-Sweet, Jean, Rosenberg, Robert, Eisenbraun, Eric, and Noyan, I. C. Prediction of recrystallization times in electroplated copper thin films. Netherlands: N. p., 2016.
Web. doi:10.1016/j.tsf.2016.06.056.
Treger, Mikhail, Witt, Christian, Cabral, Jr., Cyril, Murray, Conal, Jordan-Sweet, Jean, Rosenberg, Robert, Eisenbraun, Eric, & Noyan, I. C. Prediction of recrystallization times in electroplated copper thin films. Netherlands. https://doi.org/10.1016/j.tsf.2016.06.056
Treger, Mikhail, Witt, Christian, Cabral, Jr., Cyril, Murray, Conal, Jordan-Sweet, Jean, Rosenberg, Robert, Eisenbraun, Eric, and Noyan, I. C. Thu .
"Prediction of recrystallization times in electroplated copper thin films". Netherlands. https://doi.org/10.1016/j.tsf.2016.06.056.
@article{osti_1359949,
title = {Prediction of recrystallization times in electroplated copper thin films},
author = {Treger, Mikhail and Witt, Christian and Cabral, Jr., Cyril and Murray, Conal and Jordan-Sweet, Jean and Rosenberg, Robert and Eisenbraun, Eric and Noyan, I. C.},
abstractNote = {},
doi = {10.1016/j.tsf.2016.06.056},
journal = {Thin Solid Films},
number = C,
volume = 615,
place = {Netherlands},
year = {2016},
month = {9}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.tsf.2016.06.056
https://doi.org/10.1016/j.tsf.2016.06.056
Other availability
Cited by: 3 works
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