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Title: Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

Pattern generation of well-controlled block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography. In this paper, we used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and toluene, well-ordered line, honeycomb, circular hole, and lamellar nanostructures were obtained from a cylinder-forming poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) BCP with high χ. Furthermore, a well-aligned 12 nm line pattern was successfully achieved in the guiding template within one minute using the mixed solvents. Finally, this practical method may also be applicable to self-assembly of other BCPs, providing more opportunities for the next-generation sub-10 nm lithography applications.
Authors:
 [1] ;  [2] ;  [2] ;  [2] ;  [2] ;  [1]
  1. Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Nanoscience and Technology Division
Publication Date:
Grant/Contract Number:
AC02-06CH11357
Type:
Accepted Manuscript
Journal Name:
Nanoscale
Additional Journal Information:
Journal Volume: 6; Journal Issue: 24; Journal ID: ISSN 2040-3364
Publisher:
Royal Society of Chemistry
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; block copolymers; honeycomb; lithography; rapid self-assembly; solvent vapor annealing
OSTI Identifier:
1357472

Park, Woon Ik, Tong, Sheng, Liu, Yuzi, Jung, Il Woong, Roelofs, Andreas, and Hong, Seungbum. Tunable and rapid self-assembly of block copolymers using mixed solvent vapors. United States: N. p., Web. doi:10.1039/C4NR04726E.
Park, Woon Ik, Tong, Sheng, Liu, Yuzi, Jung, Il Woong, Roelofs, Andreas, & Hong, Seungbum. Tunable and rapid self-assembly of block copolymers using mixed solvent vapors. United States. doi:10.1039/C4NR04726E.
Park, Woon Ik, Tong, Sheng, Liu, Yuzi, Jung, Il Woong, Roelofs, Andreas, and Hong, Seungbum. 2014. "Tunable and rapid self-assembly of block copolymers using mixed solvent vapors". United States. doi:10.1039/C4NR04726E. https://www.osti.gov/servlets/purl/1357472.
@article{osti_1357472,
title = {Tunable and rapid self-assembly of block copolymers using mixed solvent vapors},
author = {Park, Woon Ik and Tong, Sheng and Liu, Yuzi and Jung, Il Woong and Roelofs, Andreas and Hong, Seungbum},
abstractNote = {Pattern generation of well-controlled block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography. In this paper, we used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and toluene, well-ordered line, honeycomb, circular hole, and lamellar nanostructures were obtained from a cylinder-forming poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) BCP with high χ. Furthermore, a well-aligned 12 nm line pattern was successfully achieved in the guiding template within one minute using the mixed solvents. Finally, this practical method may also be applicable to self-assembly of other BCPs, providing more opportunities for the next-generation sub-10 nm lithography applications.},
doi = {10.1039/C4NR04726E},
journal = {Nanoscale},
number = 24,
volume = 6,
place = {United States},
year = {2014},
month = {11}
}