skip to main content

DOE PAGESDOE PAGES

Title: In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy

In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-ray and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Finally, additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.
Authors:
 [1] ; ORCiD logo [2] ;  [3] ;  [3] ;  [3] ; ORCiD logo [1] ;  [1]
  1. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source; Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science and Engineering
  3. Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
Publication Date:
Grant/Contract Number:
AC02-06CH11357
Type:
Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 87; Journal Issue: 1; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics (AIP)
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Contributing Orgs:
Northwestern Univ., Evanston, IL (United States)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 36 MATERIALS SCIENCE; Thin film growth; Reflection high energy electron diffraction; Molecular beam epitaxy; Vacuum chambers; X-ray scattering
OSTI Identifier:
1356978
Alternate Identifier(s):
OSTI ID: 1234176