In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy
Abstract
In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-ray and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Finally, additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.
- Authors:
-
[2];
[1];
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source; Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science and Engineering
- Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
- Publication Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Contributing Org.:
- Northwestern Univ., Evanston, IL (United States)
- OSTI Identifier:
- 1356978
- Alternate Identifier(s):
- OSTI ID: 1234176
- Grant/Contract Number:
- AC02-06CH11357
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Review of Scientific Instruments
- Additional Journal Information:
- Journal Volume: 87; Journal Issue: 1; Journal ID: ISSN 0034-6748
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 36 MATERIALS SCIENCE; Thin film growth; Reflection high energy electron diffraction; Molecular beam epitaxy; Vacuum chambers; X-ray scattering
Citation Formats
Lee, J. H., Tung, I. C., Chang, S. -H., Bhattacharya, A., Fong, D. D., Freeland, J. W., and Hong, Hawoong. In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy. United States: N. p., 2016.
Web. doi:10.1063/1.4939100.
Lee, J. H., Tung, I. C., Chang, S. -H., Bhattacharya, A., Fong, D. D., Freeland, J. W., & Hong, Hawoong. In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy. United States. https://doi.org/10.1063/1.4939100
Lee, J. H., Tung, I. C., Chang, S. -H., Bhattacharya, A., Fong, D. D., Freeland, J. W., and Hong, Hawoong. Tue .
"In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy". United States. https://doi.org/10.1063/1.4939100. https://www.osti.gov/servlets/purl/1356978.
@article{osti_1356978,
title = {In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy},
author = {Lee, J. H. and Tung, I. C. and Chang, S. -H. and Bhattacharya, A. and Fong, D. D. and Freeland, J. W. and Hong, Hawoong},
abstractNote = {In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-ray and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Finally, additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.},
doi = {10.1063/1.4939100},
journal = {Review of Scientific Instruments},
number = 1,
volume = 87,
place = {United States},
year = {Tue Jan 05 00:00:00 EST 2016},
month = {Tue Jan 05 00:00:00 EST 2016}
}
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- Physical Review Materials, Vol. 1, Issue 5
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- Annese, Emilia; dos Santos, Joacir E.; Rodrigues, Gustavo Lorencini M. P.
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