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Title: Structure and enhanced thermochromic performance of low-temperature fabricated VO 2/V 2O 3 thin film

For VO 2-based smart window manufacture, it is a long-standing demand for high-quality thin films deposited at low temperature. In this paper, the thermochromic films of VO 2 were deposited by a magnetron sputtering method at a fairly low temperature of 250 °C without subsequent annealing by embedding a V 2O 3 interlayer. V 2O 3 acts as a seed layer to lower the depositing temperature and buffer layer to epitaxial grow VO 2 film. The VO 2/V 2O 3 films display high solar modulating ability and narrow hysteresis loop. Finally, our data can serve as a promising point for industrial production with high degree of crystallinity at a low temperature.
 [1] ;  [1] ;  [2] ;  [1] ;  [1] ;  [1] ;  [3]
  1. Chinese Academy of Sciences (CAS), Shanghai (China). State Key Lab. of High Performance Ceramics and Superfine Microstructure. Shanghai Inst. of Ceramics
  2. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division. Thin Films and Nanostructures Group
  3. (Japan). Materials Research Inst. for Sustainable Development
Publication Date:
Grant/Contract Number:
14DZ2261203; 5157021410
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 109; Journal Issue: 14; Journal ID: ISSN 0003-6951
American Institute of Physics (AIP)
Research Org:
Chinese Academy of Sciences (CAS), Shanghai (China)
Sponsoring Org:
USDOE; Science and Technology Commission of Shanghai Municipality (STCSM) (China)
Contributing Orgs:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); National Inst. of Advanced Industrial Science and Technology, Nagoya (Japan)
Country of Publication:
United States
36 MATERIALS SCIENCE; Sputter deposition; Thin film structure; Epitaxy; Sapphire; X-ray diffraction
OSTI Identifier: