Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses

Bachman, Daniel; Chen, Zhijiang; Wang, Christopher; Fedosejevs, Robert; Tsui, Ying Y.; Van, Vien

doi:10.1109/JLT.2016.2633317

Title: Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses

Abstract

Phase errors caused by fabrication variations in silicon photonic integrated circuits are an important problem, which negatively impacts device yield and performance. This study reports our recent progress in the development of a method for permanent, postfabrication phase error correction of silicon photonic circuits based on femtosecond laser irradiation. Using beam shaping technique, we achieve a 14-fold enhancement in the phase tuning resolution of the method with a Gaussian-shaped beam compared to a top-hat beam. The large improvement in the tuning resolution makes the femtosecond laser method potentially useful for very fine phase trimming of silicon photonic circuits. Finally, we also show that femtosecond laser pulses can directly modify silicon photonic devices through a SiO₂ cladding layer, making it the only permanent post-fabrication method that can tune silicon photonic circuits protected by an oxide cladding.

Authors:

Bachman, Daniel ^[1]; Chen, Zhijiang ^[2]; Wang, Christopher ^[1]; Fedosejevs, Robert ^[1]; Tsui, Ying Y. ^[1];

^[1]

Univ. of Alberta, Edmonton, AB (Canada). Dept. of Electrical and Computer Engineering
SLAC National Accelerator Lab., Menlo Park, CA (United States); Univ. of Alberta, Edmonton, AB (Canada)

Publication Date:: Tue Nov 29 00:00:00 EST 2016

Research Org.:: Univ. of Alberta, Edmonton, AB (Canada); SLAC National Accelerator Lab., Menlo Park, CA (United States)

Sponsoring Org.:: USDOE; Natural Sciences and Engineering Research Council of Canada (NSERC)

OSTI Identifier:: 1353179

Grant/Contract Number:: AC02-76SF00515

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Lightwave Technology

Additional Journal Information:: Journal Volume: 35; Journal Issue: 4; Journal ID: ISSN 0733-8724

Publisher:: IEEE

Country of Publication:: United States

Language:: English

Subject:: 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; Femtosecond laser irradiation; Phase error correction; Post-fabrication index trimming; Silicon photonic circuits

Citation Formats


                    Bachman, Daniel, Chen, Zhijiang, Wang, Christopher, Fedosejevs, Robert, Tsui, Ying Y., and Van, Vien. Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses.  United States: N. p., 2016. 
Web.  doi:10.1109/JLT.2016.2633317.

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                    Bachman, Daniel, Chen, Zhijiang, Wang, Christopher, Fedosejevs, Robert, Tsui, Ying Y., & Van, Vien. Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses.  United States.  https://doi.org/10.1109/JLT.2016.2633317

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                    Bachman, Daniel, Chen, Zhijiang, Wang, Christopher, Fedosejevs, Robert, Tsui, Ying Y., and Van, Vien. Tue .  
"Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses".  United States.  https://doi.org/10.1109/JLT.2016.2633317.  https://www.osti.gov/servlets/purl/1353179.

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@article{osti_1353179,

  title        = {Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses},

  author       = {Bachman, Daniel and Chen, Zhijiang and Wang, Christopher and Fedosejevs, Robert and Tsui, Ying Y. and Van, Vien},

  abstractNote = {Phase errors caused by fabrication variations in silicon photonic integrated circuits are an important problem, which negatively impacts device yield and performance. This study reports our recent progress in the development of a method for permanent, postfabrication phase error correction of silicon photonic circuits based on femtosecond laser irradiation. Using beam shaping technique, we achieve a 14-fold enhancement in the phase tuning resolution of the method with a Gaussian-shaped beam compared to a top-hat beam. The large improvement in the tuning resolution makes the femtosecond laser method potentially useful for very fine phase trimming of silicon photonic circuits. Finally, we also show that femtosecond laser pulses can directly modify silicon photonic devices through a SiO2 cladding layer, making it the only permanent post-fabrication method that can tune silicon photonic circuits protected by an oxide cladding.},

  doi          = {10.1109/JLT.2016.2633317},

  journal      = {Journal of Lightwave Technology},

  number       = 4,

  volume       = 35,

  place        = {United States},

  year         = {Tue Nov 29 00:00:00 EST 2016},

  month        = {Tue Nov 29 00:00:00 EST 2016}

}

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Title: Postfabrication Phase Error Correction of Silicon Photonic Circuits by Single Femtosecond Laser Pulses

Abstract

Citation Formats

Real-time monitoring and gradient feedback enable accurate trimming of ion-implanted silicon photonic devices journal, January 2018

Real-time monitoring and gradient feedback enable accurate trimming of ion-implanted silicon photonic devices
journal, January 2018