In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS
Abstract
APXPS was used to investigate the effect of oxygen adsorption on the band bending and electron affinity of ALD Al2O3, ZnO and TiO2ultrathin films.
- Authors:
-
- Soochow Univ., Suzhou (China). Inst. of Functional Nano and Soft Materials (FUNSOM) and Jiangsu Key Lab. for Carbon-Based Functional Materials and Devices; Chinese Academy of Sciences (CAS), Shanghai (China). State Key Lab. of Functional Materials for Informatics and Shanghai Inst. of Microsystem and Information Technology; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
- Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
- Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division and Nanoscience and Technology Division; Yale Univ., New Haven, CT (United States). Dept. of Chemical and Environmental Engineering and School of Engineering and Applied Science; Univ. of Chicago, IL (United States). Inst. of Molecular Engineering
- Chinese Academy of Sciences (CAS), Shanghai (China). State Key Lab. of Functional Materials for Informatics and Shanghai Inst. of Microsystem and Information Technology; ShanghaiTech Univ., Shanghai (China). School of Physical Science and Technology
- Soochow Univ., Suzhou (China). Inst. of Functional Nano and Soft Materials (FUNSOM) and Jiangsu Key Lab. for Carbon-Based Functional Materials and Devices
- Chinese Academy of Sciences (CAS), Shanghai (China). State Key Lab. of Functional Materials for Informatics and Shanghai Inst. of Microsystem and Information Technology; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS); ShanghaiTech Univ., Shanghai (China). School of Physical Science and Technology
- Publication Date:
- Research Org.:
- Argonne National Lab. (ANL), Argonne, IL (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); Materials Sciences and Engineering Division; National Natural Science Foundation of China (NSFC)
- OSTI Identifier:
- 1352564
- Alternate Identifier(s):
- OSTI ID: 1454449
- Grant/Contract Number:
- AC02-06CH11357; AC02-05CH11231; 11227902; 61274019
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Catalysis Science and Technology
- Additional Journal Information:
- Journal Volume: 6; Journal Issue: 18; Journal ID: ISSN 2044-4753
- Publisher:
- Royal Society of Chemistry
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE
Citation Formats
Mao, Bao-Hua, Crumlin, Ethan, Tyo, Eric C., Pellin, Michael J., Vajda, Stefan, Li, Yimin, Wang, Sui-Dong, and Liu, Zhi. In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS. United States: N. p., 2016.
Web. doi:10.1039/c6cy00575f.
Mao, Bao-Hua, Crumlin, Ethan, Tyo, Eric C., Pellin, Michael J., Vajda, Stefan, Li, Yimin, Wang, Sui-Dong, & Liu, Zhi. In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS. United States. https://doi.org/10.1039/c6cy00575f
Mao, Bao-Hua, Crumlin, Ethan, Tyo, Eric C., Pellin, Michael J., Vajda, Stefan, Li, Yimin, Wang, Sui-Dong, and Liu, Zhi. Thu .
"In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS". United States. https://doi.org/10.1039/c6cy00575f. https://www.osti.gov/servlets/purl/1352564.
@article{osti_1352564,
title = {In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS},
author = {Mao, Bao-Hua and Crumlin, Ethan and Tyo, Eric C. and Pellin, Michael J. and Vajda, Stefan and Li, Yimin and Wang, Sui-Dong and Liu, Zhi},
abstractNote = {APXPS was used to investigate the effect of oxygen adsorption on the band bending and electron affinity of ALD Al2O3, ZnO and TiO2ultrathin films.},
doi = {10.1039/c6cy00575f},
journal = {Catalysis Science and Technology},
number = 18,
volume = 6,
place = {United States},
year = {Thu Jul 21 00:00:00 EDT 2016},
month = {Thu Jul 21 00:00:00 EDT 2016}
}
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Works referencing / citing this record:
In situ work-function measurement during chemical transformation of MoS 2 to MoO 3 by ambient-pressure x-ray photoelectron spectroscopy
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