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Title: Chemical vapor deposition of monolayer MoS 2 directly on ultrathin Al 2 O 3 for low-power electronics

Authors:
 [1] ; ORCiD logo [1] ;  [1] ;  [1] ; ORCiD logo [1] ; ORCiD logo [2] ;  [3] ;  [4] ; ORCiD logo [5]
  1. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
  2. Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, USA
  3. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA, Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, USA, Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208, USA
  4. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA, Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA
  5. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA, Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, USA, Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA, Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA
Publication Date:
Grant/Contract Number:
SC0001059
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 110; Journal Issue: 5; Related Information: CHORUS Timestamp: 2018-02-14 18:57:00; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1351027