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Title: Model-based optimization of near-field binary-pixelated beam shapers

The optimization of components that rely on spatially dithered distributions of transparent or opaque pixels and an imaging system with far-field filtering for transmission control is demonstrated. The binary-pixel distribution can be iteratively optimized to lower an error function that takes into account the design transmission and the characteristics of the required far-field filter. Simulations using a design transmission chosen in the context of high-energy lasers show that the beam-fluence modulation at an image plane can be reduced by a factor of 2, leading to performance similar to using a non-optimized spatial-dithering algorithm with pixels of size reduced by a factor of 2 without the additional fabrication complexity or cost. The optimization process preserves the pixel distribution statistical properties. Analysis shows that the optimized pixel distribution starting from a high-noise distribution defined by a random-draw algorithm should be more resilient to fabrication errors than the optimized pixel distributions starting from a low-noise, error-diffusion algorithm, while leading to similar beamshaping performance. Furthermore, this is confirmed by experimental results obtained with various pixel distributions and induced fabrication errors.
 [1] ;  [1]
  1. Univ. of Rochester, Rochester, NY (United States). Lab. for Laser Energetics
Publication Date:
Report Number(s):
2016-2015; 1325
Journal ID: ISSN 0003-6935; APOPAI; 2016-205; 1325; 2280
Grant/Contract Number:
Accepted Manuscript
Journal Name:
Applied Optics
Additional Journal Information:
Journal Volume: 56; Journal Issue: 4; Journal ID: ISSN 0003-6935
Optical Society of America (OSA)
Research Org:
Univ. of Rochester, Rochester, NY (United States). Lab. for Laser Energetics
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA)
Contributing Orgs:
Laboratory for Laser Energetics, University of Rochester, Rochester, NY
Country of Publication:
United States
43 PARTICLE ACCELERATORS; laser beam shaping; halftone image reproduction; apodization
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1339784