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Title: Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy

Abstract

The oxidation behavior of NiAl(100) by molecular oxygen and water vapor under a near-ambient pressure of 0.2 Torr is monitored using ambient-pressure X-ray photoelectron spectroscopy. O 2 exposure leads to the selective oxidation of Al at temperatures ranging from 40 to 500 °C. By contrast, H 2O exposure results in the selective oxidation of Al at 40 and 200 °C, and increasing the oxidation temperature above 300 °C leads to simultaneous formation of both Al and Ni oxides. Furthermore, these results demonstrate that the O 2 oxidation forms a nearly stoichiometric Al 2O 3 structure that provides improved protection to the metallic substrate by barring the outward diffusion of metals. By contrast, the H 2O oxidation results in the formation of a defective oxide layer that allows outward diffusion of Ni at elevated temperatures for simultaneous NiO formation.

Authors:
 [1];  [1];  [2];  [1]
  1. State Univ. of New York, Binghamton, NY (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States)
Publication Date:
Research Org.:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1345737
Report Number(s):
BNL-113577-2017-JA
Journal ID: ISSN 0743-7463; KC0403020; TRN: US1701531
Grant/Contract Number:  
SC00112704
Resource Type:
Accepted Manuscript
Journal Name:
Langmuir
Additional Journal Information:
Journal Volume: 32; Journal Issue: 44; Journal ID: ISSN 0743-7463
Publisher:
American Chemical Society
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Liu, Qianqian, Qin, Hailang, Boscoboinik, Jorge Anibal, and Zhou, Guangwen. Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy. United States: N. p., 2016. Web. doi:10.1021/acs.langmuir.6b02752.
Liu, Qianqian, Qin, Hailang, Boscoboinik, Jorge Anibal, & Zhou, Guangwen. Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy. United States. doi:10.1021/acs.langmuir.6b02752.
Liu, Qianqian, Qin, Hailang, Boscoboinik, Jorge Anibal, and Zhou, Guangwen. Tue . "Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy". United States. doi:10.1021/acs.langmuir.6b02752. https://www.osti.gov/servlets/purl/1345737.
@article{osti_1345737,
title = {Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy},
author = {Liu, Qianqian and Qin, Hailang and Boscoboinik, Jorge Anibal and Zhou, Guangwen},
abstractNote = {The oxidation behavior of NiAl(100) by molecular oxygen and water vapor under a near-ambient pressure of 0.2 Torr is monitored using ambient-pressure X-ray photoelectron spectroscopy. O2 exposure leads to the selective oxidation of Al at temperatures ranging from 40 to 500 °C. By contrast, H2O exposure results in the selective oxidation of Al at 40 and 200 °C, and increasing the oxidation temperature above 300 °C leads to simultaneous formation of both Al and Ni oxides. Furthermore, these results demonstrate that the O2 oxidation forms a nearly stoichiometric Al2O3 structure that provides improved protection to the metallic substrate by barring the outward diffusion of metals. By contrast, the H2O oxidation results in the formation of a defective oxide layer that allows outward diffusion of Ni at elevated temperatures for simultaneous NiO formation.},
doi = {10.1021/acs.langmuir.6b02752},
journal = {Langmuir},
number = 44,
volume = 32,
place = {United States},
year = {2016},
month = {10}
}

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Cited by: 1 work
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