Enhanced electrical activation in In-implanted Ge by C co-doping
- Australian National Univ., Canberra, ACT (Australia)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Katholieke Univ. Leuven, Heverlee (Belgium). Inst. voor Kern- en Stralingsfysica
- Australian Nuclear Science and Technology Organisation (ANSTO), Melbourne, VIC (Australia). Australian Synchrotron
- RMIT Univ., Melbourne (Australia)
At high dopant concentrations in Ge, electrically activating all implanted dopants is a major obstacle in the fulfillment of high-performance Ge-channel complementary metal oxide semiconductor devices. In this letter, we demonstrate a significant increase in the electrically-active dopant fraction in In-implanted Ge by co-doping with the isovalent element C. Electrical measurements have been correlated with x-ray absorption spectroscopy and transmission electron microscopy results in addition to density functional theory simulations. With C þ In co-doping, the electrically active fraction was doubled and tripled at In concentrations of 0.2 and 0.7 at. %, respectively. This marked improvement was the result of C-In pair formation such that In-induced strain in the Ge lattice was reduced while the precipitation of In and the formation of In-V clusters were both suppressed.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- SC00112704
- OSTI ID:
- 1341590
- Report Number(s):
- BNL-111930-2016-JA; R&D Project: 20685
- Journal Information:
- Applied Physics Letters, Vol. 107, Issue 21; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
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