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Title: Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO 3

Abstract

We use real-time diffuse surface x-ray diffraction to probe the evolution of island size distributions and its effects on surface smoothing in pulsed laser deposition (PLD) of SrTiO 3. In this study, we show that the island size evolution obeys dynamic scaling and two distinct regimes of island growth kinetics. Our data show that PLD film growth can persist without roughening despite thermally driven Ostwald ripening, the main mechanism for surface smoothing, being shut down. The absence of roughening is concomitant with decreasing island density, contradicting the prevailing view that increasing island density is the key to surface smoothing in PLD. We also report a previously unobserved crossover from diffusion-limited to attachment-limited island growth that reveals the influence of nonequilibrium atomic level surface transport processes on the growth modes in PLD. We show by direct measurements that attachment-limited island growth is the dominant process in PLD that creates step flowlike behavior or quasistep flow as PLD “self-organizes” local step flow on a length scale consistent with the substrate temperature and PLD parameters.

Authors:
 [1];  [2];  [3];  [1];  [3];  [2];  [4];  [1]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS) and X-Ray Science Division
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)
  4. (BNL), Upton, NY (United States). Photon Sciences Division
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1341531
Alternate Identifier(s):
OSTI ID: 1331836; OSTI ID: 1393457
Grant/Contract Number:  
AC05-00OR22725; AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 117; Journal Issue: 20; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; pulsed laser deposition; surface x-ray diffraction; island growth; quasi step flow

Citation Formats

Eres, Gyula, Tischler, J. Z., Rouleau, C. M., Lee, Ho Nyung, Christen, H. M., Zschack, P., Brookhaven National Lab., and Larson, B. C. Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3. United States: N. p., 2016. Web. doi:10.1103/PhysRevLett.117.206102.
Eres, Gyula, Tischler, J. Z., Rouleau, C. M., Lee, Ho Nyung, Christen, H. M., Zschack, P., Brookhaven National Lab., & Larson, B. C. Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3. United States. doi:10.1103/PhysRevLett.117.206102.
Eres, Gyula, Tischler, J. Z., Rouleau, C. M., Lee, Ho Nyung, Christen, H. M., Zschack, P., Brookhaven National Lab., and Larson, B. C. Fri . "Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3". United States. doi:10.1103/PhysRevLett.117.206102. https://www.osti.gov/servlets/purl/1341531.
@article{osti_1341531,
title = {Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3},
author = {Eres, Gyula and Tischler, J. Z. and Rouleau, C. M. and Lee, Ho Nyung and Christen, H. M. and Zschack, P. and Brookhaven National Lab. and Larson, B. C.},
abstractNote = {We use real-time diffuse surface x-ray diffraction to probe the evolution of island size distributions and its effects on surface smoothing in pulsed laser deposition (PLD) of SrTiO3. In this study, we show that the island size evolution obeys dynamic scaling and two distinct regimes of island growth kinetics. Our data show that PLD film growth can persist without roughening despite thermally driven Ostwald ripening, the main mechanism for surface smoothing, being shut down. The absence of roughening is concomitant with decreasing island density, contradicting the prevailing view that increasing island density is the key to surface smoothing in PLD. We also report a previously unobserved crossover from diffusion-limited to attachment-limited island growth that reveals the influence of nonequilibrium atomic level surface transport processes on the growth modes in PLD. We show by direct measurements that attachment-limited island growth is the dominant process in PLD that creates step flowlike behavior or quasistep flow as PLD “self-organizes” local step flow on a length scale consistent with the substrate temperature and PLD parameters.},
doi = {10.1103/PhysRevLett.117.206102},
journal = {Physical Review Letters},
number = 20,
volume = 117,
place = {United States},
year = {2016},
month = {11}
}

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Works referenced in this record:

Interlayer Mass Transport in Homoepitaxial and Heteroepitaxial Metal Growth
journal, July 1995


Steps on surfaces: experiment and theory
journal, September 1999


Nonequilibrium Interlayer Transport in Pulsed Laser Deposition
journal, June 2006


Atomistic Processes in the Early Stages of Thin-Film Growth
journal, April 1997


Critical island size for layer-by-layer growth
journal, January 1994


Measurements of Surface Diffusivity and Coarsening during Pulsed Laser Deposition
journal, December 2009


Emergent phenomena at oxide interfaces
journal, January 2012

  • Hwang, H. Y.; Iwasa, Y.; Kawasaki, M.
  • Nature Materials, Vol. 11, Issue 2
  • DOI: 10.1038/nmat3223

Persistent Step-Flow Growth of Strained Films on Vicinal Substrates
journal, August 2005


Initial Stages of Thin Film Growth in the Presence of Island-Edge Barriers
journal, January 1997


Time-resolved study of SrTiO3 homoepitaxial pulsed-laser deposition using surface x-ray diffraction
journal, May 2002

  • Eres, G.; Tischler, J. Z.; Yoon, M.
  • Applied Physics Letters, Vol. 80, Issue 18
  • DOI: 10.1063/1.1477279

Recent advances in pulsed-laser deposition of complex oxides
journal, June 2008