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Title: Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO 3

Abstract

We use real-time diffuse surface x-ray diffraction to probe the evolution of island size distributions and its effects on surface smoothing in pulsed laser deposition (PLD) of SrTiO3. We show that the island size evolution obeys dynamic scaling and two distinct regimes of island growth kinetics. Our data show that PLD film growth can persist without roughening despite thermally driven Ostwald ripening, the main mechanism for surface smoothing, being shut down. The absence of roughening is concomitant with decreasing island density, contradicting the prevailing view that increasing island density is the key to surface smoothing in PLD. We also report a previously unobserved crossover from diffusion-limited to attachment-limited island growth that reveals the influence of nonequilibrium atomic level surface transport processes on the growth modes in PLD. We show by direct measurements that attachment-limited island growth is the dominant process in PLD that creates step flowlike behavior or quasistep flow as PLD “self-organizes” local step flow on a length scale consistent with the substrate temperature and PLD parameters.

Authors:
 [1];  [2];  [3];  [1];  [3];  [2];  [4];  [1]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS) and X-Ray Science Division
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)
  4. (BNL), Upton, NY (United States). Photon Sciences Division
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1341531
Alternate Identifier(s):
OSTI ID: 1331836; OSTI ID: 1393457
Grant/Contract Number:  
AC05-00OR22725; AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 117; Journal Issue: 20; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; pulsed laser deposition; surface x-ray diffraction; island growth; quasi step flow

Citation Formats

Eres, Gyula, Tischler, J. Z., Rouleau, C. M., Lee, Ho Nyung, Christen, H. M., Zschack, P., Brookhaven National Lab., and Larson, B. C. Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3. United States: N. p., 2016. Web. doi:10.1103/PhysRevLett.117.206102.
Eres, Gyula, Tischler, J. Z., Rouleau, C. M., Lee, Ho Nyung, Christen, H. M., Zschack, P., Brookhaven National Lab., & Larson, B. C. Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3. United States. doi:10.1103/PhysRevLett.117.206102.
Eres, Gyula, Tischler, J. Z., Rouleau, C. M., Lee, Ho Nyung, Christen, H. M., Zschack, P., Brookhaven National Lab., and Larson, B. C. Fri . "Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3". United States. doi:10.1103/PhysRevLett.117.206102. https://www.osti.gov/servlets/purl/1341531.
@article{osti_1341531,
title = {Dynamic Scaling and Island Growth Kinetics in Pulsed Laser Deposition of SrTiO3},
author = {Eres, Gyula and Tischler, J. Z. and Rouleau, C. M. and Lee, Ho Nyung and Christen, H. M. and Zschack, P. and Brookhaven National Lab. and Larson, B. C.},
abstractNote = {We use real-time diffuse surface x-ray diffraction to probe the evolution of island size distributions and its effects on surface smoothing in pulsed laser deposition (PLD) of SrTiO3. We show that the island size evolution obeys dynamic scaling and two distinct regimes of island growth kinetics. Our data show that PLD film growth can persist without roughening despite thermally driven Ostwald ripening, the main mechanism for surface smoothing, being shut down. The absence of roughening is concomitant with decreasing island density, contradicting the prevailing view that increasing island density is the key to surface smoothing in PLD. We also report a previously unobserved crossover from diffusion-limited to attachment-limited island growth that reveals the influence of nonequilibrium atomic level surface transport processes on the growth modes in PLD. We show by direct measurements that attachment-limited island growth is the dominant process in PLD that creates step flowlike behavior or quasistep flow as PLD “self-organizes” local step flow on a length scale consistent with the substrate temperature and PLD parameters.},
doi = {10.1103/PhysRevLett.117.206102},
journal = {Physical Review Letters},
number = 20,
volume = 117,
place = {United States},
year = {2016},
month = {11}
}

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