Calculation of Debye-Scherrer diffraction patterns from highly stressed polycrystalline materials
- Univ. of Michigan, Ann Arbor, MI (United States); SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Helmholtz Zentrum Dresden-Rossendorf, Dresden (Germany)
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Univ. of Michigan, Ann Arbor, MI (United States)
Calculations of Debye-Scherrer diffraction patterns from polycrystalline materials have typically been done in the limit of small deviatoric stresses. Although these methods are well suited for experiments conducted near hydrostatic conditions, more robust models are required to diagnose the large strain anisotropies present in dynamic compression experiments. A method to predict Debye-Scherrer diffraction patterns for arbitrary strains has been presented in the Voigt (iso-strain) limit. Here, we present a method to calculate Debye-Scherrer diffraction patterns from highly stressed polycrystalline samples in the Reuss (iso-stress) limit. This analysis uses elastic constants to calculate lattice strains for all initial crystallite orientations, enabling elastic anisotropy and sample texture effects to be modeled directly. Furthermore, the effects of probing geometry, deviatoric stresses, and sample texture are demonstrated and compared to Voigt limit predictions. An example of shock-compressed polycrystalline diamond is presented to illustrate how this model can be applied and demonstrates the importance of including material strength when interpreting diffraction in dynamic compression experiments.
- Research Organization:
- Univ. of Michigan, Ann Arbor, MI (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Fusion Energy Sciences (FES)
- Grant/Contract Number:
- NA0002956; FWP 100182
- OSTI ID:
- 1338285
- Alternate ID(s):
- OSTI ID: 1256145
- Journal Information:
- Journal of Applied Physics, Vol. 119, Issue 21; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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