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Title: Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

Authors:
 [1];  [1];  [1];  [1];  [2];  [2];  [3];  [4];  [4];  [5];  [5];  [6]
  1. College of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, New York 12203
  2. SEMATECH, Albany, New York 12203
  3. Samsung Electronics Co., Suwon-Si, Gyeonggi-do 443-742, South Korea
  4. Lawrence Berkeley National Laboratory, Berkeley, California 94720
  5. Synopsys, Mountain View, California 94043
  6. Panoramic Technology Inc., Burlingame, California 94010
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1337713
Grant/Contract Number:  
SC0006339
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Additional Journal Information:
Journal Name: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena Journal Volume: 33 Journal Issue: 2; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Upadhyaya, Mihir, Basavalingappa, Adarsh, Herbol, Henry, Denbeaux, Gregory, Jindal, Vibhu, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, and Pistor, Thomas V. Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects. United States: N. p., 2015. Web. doi:10.1116/1.4913315.
Upadhyaya, Mihir, Basavalingappa, Adarsh, Herbol, Henry, Denbeaux, Gregory, Jindal, Vibhu, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, & Pistor, Thomas V. Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects. United States. doi:10.1116/1.4913315.
Upadhyaya, Mihir, Basavalingappa, Adarsh, Herbol, Henry, Denbeaux, Gregory, Jindal, Vibhu, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, and Pistor, Thomas V. Tue . "Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects". United States. doi:10.1116/1.4913315.
@article{osti_1337713,
title = {Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects},
author = {Upadhyaya, Mihir and Basavalingappa, Adarsh and Herbol, Henry and Denbeaux, Gregory and Jindal, Vibhu and Harris-Jones, Jenah and Jang, Il-Yong and Goldberg, Kenneth A. and Mochi, Iacopo and Marokkey, Sajan and Demmerle, Wolfgang and Pistor, Thomas V.},
abstractNote = {},
doi = {10.1116/1.4913315},
journal = {Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena},
number = 2,
volume = 33,
place = {United States},
year = {2015},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1116/1.4913315

Citation Metrics:
Cited by: 2 works
Citation information provided by
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