Confocal sputtering of conformal α-β phase W films on etched Al features

Kreikebaum, John Mark; Cabrera, Blas; Yen, Jeffrey J.; Brink, Paul L.; Cherry, Matt; Tomada, Astrid; Young, Betty A.

doi:10.1116/1.4904422

Title: Confocal sputtering of conformal α-β phase W films on etched Al features

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Authors:

Kreikebaum, John Mark ^[1]; Cabrera, Blas ^[1]; Yen, Jeffrey J. ^[1]; Brink, Paul L. ^[2]; Cherry, Matt ^[2]; Tomada, Astrid ^[2]; Young, Betty A. ^[3]

Department of Physics, Stanford University, 382 Via Pueblo, Stanford, California 94305
SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025
Department of Physics, Santa Clara University, 500 El Camino Real, Santa Clara, California 95053

Publication Date:: Tue Dec 23 00:00:00 EST 2014

Sponsoring Org.:: USDOE

OSTI Identifier:: 1337708

Grant/Contract Number:: FG02-13ER41918

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Additional Journal Information:: Journal Name: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena Journal Volume: 33 Journal Issue: 1; Journal ID: ISSN 2166-2746

Publisher:: American Vacuum Society

Country of Publication:: United States

Language:: English

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                    Kreikebaum, John Mark, Cabrera, Blas, Yen, Jeffrey J., Brink, Paul L., Cherry, Matt, Tomada, Astrid, and Young, Betty A. Confocal sputtering of conformal α-β phase W films on etched Al features.  United States: N. p., 2014. 
Web.  doi:10.1116/1.4904422.

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                    Kreikebaum, John Mark, Cabrera, Blas, Yen, Jeffrey J., Brink, Paul L., Cherry, Matt, Tomada, Astrid, & Young, Betty A. Confocal sputtering of conformal α-β phase W films on etched Al features.  United States.  https://doi.org/10.1116/1.4904422

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                    Kreikebaum, John Mark, Cabrera, Blas, Yen, Jeffrey J., Brink, Paul L., Cherry, Matt, Tomada, Astrid, and Young, Betty A. Tue .  
"Confocal sputtering of conformal α-β phase W films on etched Al features".  United States.  https://doi.org/10.1116/1.4904422.

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@article{osti_1337708,

  title        = {Confocal sputtering of conformal α-β phase W films on etched Al features},

  author       = {Kreikebaum, John Mark and Cabrera, Blas and Yen, Jeffrey J. and Brink, Paul L. and Cherry, Matt and Tomada, Astrid and Young, Betty A.},

  abstractNote = {},

  doi          = {10.1116/1.4904422},

  journal      = {Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena},

  number       = 1,

  volume       = 33,

  place        = {United States},

  year         = {Tue Dec 23 00:00:00 EST 2014},

  month        = {Tue Dec 23 00:00:00 EST 2014}

}

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