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Title: Oxidation of the Ru(0001) surface covered by weakly bound, ultrathin silicate films

Bilayer silicate films grown on metal substrates are weakly bound to the metal surfaces, which allows ambient gas molecules to intercalate the oxide/metal interface. In this work, we studied the interaction of oxygen with Ru(0001) supported ultrathin silicate and aluminosilicate films at elevated O 2 pressures (10 -5–10 mbar) and temperatures (450–923 K). The results show that the silicate films stay essentially intact under these conditions, and oxygen in the film does not exchange with oxygen in the ambient. O 2 molecules readily penetrate the film and dissociate on the underlying Ru surface underneath. Also, the silicate layer does however strongly passivate the Ru surface towards RuO 2(110) oxide formation that readily occurs on bare Ru(0001) under the same conditions. Lastly, the results indicate considerable spatial effects for oxidation reactions on metal surfaces in the confined space at the interface. Moreover, the aluminosilicate films completely suppress the Ru oxidation, providing some rationale for using crystalline aluminosilicates in anti-corrosion coatings.
 [1] ;  [2] ;  [2] ;  [2] ;  [1] ;  [1]
  1. Abteilung Chemische Physik, Fritz-Haber Institut der MPG, Berlin (Germany)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)
Publication Date:
Report Number(s):
Journal ID: ISSN 0039-6028; R&D Project: 16083; KC0403020
Grant/Contract Number:
SC0012704; AC02-98CH10886
Accepted Manuscript
Journal Name:
Surface Science
Additional Journal Information:
Journal Volume: 646; Journal ID: ISSN 0039-6028
Research Org:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
36 MATERIALS SCIENCE; Ultrathin oxide films; Surface oxidation; Ru oxide; Passivation
OSTI Identifier:
Alternate Identifier(s):
OSTI ID: 1247755